Results 111 to 120 of about 3,728 (141)
Level-set-based inverse lithography for photomask synthesis
Optics Express, 2009 Inverse lithography technology (ILT) treats photomask design for microlithography as an inverse mathematical problem. We show how the inverse lithography problem can be addressed as an obstacle reconstruction problem or an extended nonlinear image ...
Yijiang Shen, Ngai Wong, Edmund Y Lam
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A Robust Computational Algorithm for Inverse Photomask Synthesis in Optical Projection Lithography [PDF]
SIAM Journal on Imaging Sciences, 2012 Inverse lithography technology formulates the photomask synthesis as an inverse mathematical problem. To solve this, we propose a variational functional and develop a robust computational algorithm, where the proposed functional takes into account the ...
Siu Kai Choy +2 more
exaly +2 more sources
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ECS Transactions, 2010
For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
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For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
openaire +1 more source
Hot-Spots Aware Inverse Lithography Technology
ECS Transactions, 2009This paper presents a new method of Inverse Lithography Technology (ILT) to accelerate its optimization process and convergence, which involves two steps in iteration: the first step is to find hot-spots in the layout in the optimization process and the second step is to optimize on the hot-spot areas.
Yiwei Yang +3 more
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Block-based inverse lithography technology with adaptive level-set algorithm
Optics and Laser TechnologyXu Ma +2 more
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GMUNet-ILT: A lightweight MLP-based network for Inverse Lithography Technology
2025 International Symposium of Electronics Design Automation (ISEDA)Dawei Gao, Yongyu Wu
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Pushing the lithography limit: applying inverse lithography technology (ILT) at the 65nm generation
SPIE Proceedings, 2006This paper presents the results of applying ILT to SMIC's first 65nm tape out. ILT mathematically determines the mask features that produce the desired on-wafer results for best pattern fidelity, largest process window or an desired combination of both.
Chi-Yuan Hung +6 more
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Seamless-merging-oriented parallel inverse lithography technology
Journal of Semiconductors, 2009Inverse lithography technology (ILT), a promising resolution enhancement technology (RET) used in next generations of IC manufacture, has the capability to push lithography to its limit. However, the existing methods of ILT are either time-consuming due to the large layout in a single process, or not accurate enough due to simply block merging in the ...
Yang Yiwei, Shi Zheng, Shen Shanhu
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SRAF rule extraction and insertion based on inverse lithography technology
Optical Microlithography XXXII, 2019The placement and size of SRAF (sub-resolution assisted feature) can greatly affect the overlapped process window. The time-consuming inverse lithography technology (ILT) can provide the co-optimization for both main pattern and SRAFs, which can guarantee the results with high precision.
Xiaojing Su +3 more
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