Results 111 to 120 of about 168 (150)
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Proceedings of SPIE, 2008
In this paper, an overview of Inverse Lithography Technology (ILT) based on Level Set Methods (LSM) is provided. Applications of ILT in the advanced lithography process are then shown for several different devices, including DRAM, SRAM, FLASH, random logic, and imaging devices.
Thuc Dam, Peter Hu, Dongxue Chen
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In this paper, an overview of Inverse Lithography Technology (ILT) based on Level Set Methods (LSM) is provided. Applications of ILT in the advanced lithography process are then shown for several different devices, including DRAM, SRAM, FLASH, random logic, and imaging devices.
Thuc Dam, Peter Hu, Dongxue Chen
exaly +2 more sources
Inverse Lithography Technology (ILT): what is the impact to the photomask industry?
SPIE Proceedings, 2006Inverse Lithography Technology (ILT) is a rigorous approach to determine the mask shapes that produce the desired on-wafer results. In this paper, we briefly describe an image (or pixel))-based implementation of ILT in comparison to OPC technologies, which are usually edge-based.
Linyong Pang
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First 65nm tape-out using inverse lithography technology (ILT)
SPIE Proceedings, 2005This paper presents SMIC's first 65nm tape out results, in particularly, using ILT. ILT mathematically determines the mask features that produce the desired on-wafer results with best wafer pattern fidelity, largest process window or both. SMIC applied it to its first 65nm tape-out to study ILT performance and benefits for deep sub-wavelength ...
Linyong Pang, Kechang Wang
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Overcome the process limitation by using inverse lithography technology with assist feature
Proceedings of SPIE, 2011Patterning of contact hole using KrF lithography system for the sub 90nm technology node is one of the most challenging tasks. Contact hole pattern can be printed using Off-Axis Illumination(OAI) such as dipole or Quasar or Quadrupole at KrF lithography system.
Guangming Xiao, Tom Cecil, Ki-Ho Baik
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Inverse lithography technology at low k1: placement and accuracy of assist features
SPIE Proceedings, 2006An implementation of inverse lithography technology is studied with special attention to illustrating and analyzing the placement, accuracy, and efficacy of subresolution assist elements. One-dimensional placement through pitch is characterized, and 2D capability is demonstrated for repeated patterns.
Linyong Pang
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Improvement of KrF contact layer by inverse lithography technology with assist feature
Proceedings of SPIE, 2010Patterning of contact holes using KrF lithography system is one of the most challenging tasks for the sub-90nm technology node,. Contact hole patterns can be printed with a KrF lithography system using Off-Axis Illumination (OAI) such as Quasar or Quadrupole.
Guangming Xiao, Tom Cecil, Grace Dai
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Machine learning based inverse lithography technology for an advanced DRAM contact layer
DTCO and Computational Patterning II, 2023Kyle Braam, Chanha Park
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A Gradient-Based Inverse Lithography Technology for Double-Dipole Lithography
2009 International Conference on Simulation of Semiconductor Processes and Devices, 2009Resolution enhancement techniques (RETs) have become indispensable for the sub-wavelength optical lithography. Inverse lithography technology (ILT) is one kind of RETs, which attempts to consider the mask synthesis as an inverse problem and compute the optimum mask by using the entire area of the design pattern with a rigorous mathematical approach ...
Wei Xiong +4 more
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ECS Transactions, 2010
For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
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For semiconductor manufacturers moving toward advanced technology nodes -32nm, 22nm and below - lithography presents the greatest challenge, because it is fundamentally constrained by basic principles of optical physics. Because no major lithography hardware improvements are expected over the next couple years, Computational Lithography has been ...
Linyong Pang +10 more
openaire +1 more source
Block-based inverse lithography technology with adaptive level-set algorithm
Optics and Laser TechnologyGonzalo Arce, Shengen Zhang, Xu Ma
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