Results 221 to 230 of about 243,893 (286)

Plasma-driven formation of vertically aligned silver-phosphorus core-shell nanostructures. [PDF]

Sci Rep
Marzoughi M, Babaee O, Mohajerzadeh S.
europepmc   +1 more source

Interlayer-Catalyst Method for Metal-Assisted Chemical Etching of Ultra-High Aspect Ratio Silicon Nanostructures. [PDF]

Small Methods
Benz BPJ, Stampanoni M, Romano L.
europepmc   +1 more source

Printable grayscale nano-template for full-colour organic light-emitting diode near-eye displays with 3D achromatic metalenses. [PDF]

Nat Commun
Jeon Y, Park C, Seong J, Rho J.
europepmc   +1 more source

Anisotropic water sliding radiative cooling emitter for atmospheric water harvesting. [PDF]

RSC Adv
Gao K, JiajiaWu, Li J, Sun L.
europepmc   +1 more source

Decoding Directional Control in Metal-Assisted Chemical Etching via Catalyst Architecture. [PDF]

Adv Mater
Han Y, Jeong J, Cho H, Ahn Y, Park S, Kim H, Shin JY, Park MJ, Kim T, Um HD.   +9 more
europepmc   +1 more source

Evolution of Fused Silica Subsurface Damage in Chemical Etching and Its Influence on Surface Loss. [PDF]

Sensors (Basel)
Zhang X, Zu C, Wang L, Song X, Sun Y, Du X, Zhu Y.   +6 more
europepmc   +1 more source

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Plasma-based isotropic etching polishing of synthetic quartz

Journal of Manufacturing Processes, 2020
Abstract To efficiently eliminate the surface defects and subsurface damage layer of synthetic quartz introduced by grinding, a plasma-based isotropic etching polishing (plasma-IEP) technique is proposed in this study. The smoothing of synthetic quartz by plasma-IEP is attributed to the formation, overlapping and merging of numerous and ultra-smooth ...
Hui Deng, Yaguo Li, Wang Liu
exaly   +2 more sources

High Rate Copper Isotropic Wet Chemical Etching

ECS Transactions, 2011
A high-rate copper isotropic wet-etching process has been developed. The process is found to be surface-kinetic controlled, so the etching rate within the isolated feature does not increase upon removal of all metal from the field, as well as remains flat and uniform across individual feature and across an array of features, independent of feature ...
Steven T. Mayer
openaire   +2 more sources

A generic approach of polishing metals via isotropic electrochemical etching [PDF]

International Journal of Machine Tools and Manufacture, 2020
Isotropic etching polishing (IEP), which is based on the merging of hemispherical holes that are formed by isotropic etching, is proposed in this study as a universal metal finishing approach.
XinQuan Zhang, Hui Deng, Fengzhou Fang
exaly   +2 more sources