Results 11 to 20 of about 299,640 (375)

Two‐Photon Polymerization Lithography for Optics and Photonics: Fundamentals, Materials, Technologies, and Applications

open access: yesAdvanced Functional Materials, 2023
The rapid development of additive manufacturing has fueled a revolution in various research fields and industrial applications. Among the myriad of advanced 3D printing techniques, two‐photon polymerization lithography (TPL) uniquely offers a significant
Hao Wang   +16 more
semanticscholar   +1 more source

Evolution in Lithography Techniques: Microlithography to Nanolithography

open access: yesNanomaterials, 2022
In this era, electronic devices such as mobile phones, computers, laptops, sensors, and many more have become a necessity in healthcare, for a pleasant lifestyle, and for carrying out tasks quickly and easily.
Ekta Sharma   +6 more
semanticscholar   +1 more source

Nanomotor lithography [PDF]

open access: yesNature Communications, 2014
The rapid miniaturization of devices and machines has fuelled the evolution of advanced fabrication techniques. However, the complexity and high cost of the state-of-the-art high-resolution lithographic systems are prompting unconventional routes for nanoscale patterning. Inspired by natural nanomachines, synthetic nanomotors have recently demonstrated
Li, Jinxing   +5 more
openaire   +4 more sources

Inverse lithography technology: 30 years from concept to practical, full-chip reality

open access: yesJournal of Micro/Nanopatterning, Materials, and Metrology, 2021
. In lithography, optical proximity and process bias/effects need to be corrected to achieve the best wafer print. Efforts to correct for these effects started with a simple bias, adding a hammer head in line-ends to prevent line-end shortening.
L. Pang
semanticscholar   +1 more source

Rolling Nanoelectrode Lithography [PDF]

open access: yesMicromachines, 2020
Non-uniformity and low throughput issues severely limit the application of nanoelectrode lithography for large area nanopatterning. This paper proposes, for the first time, a new rolling nanoelectrode lithography approach to overcome these challenges. A test-bed was developed to realize uniform pressure distribution over the whole contact area between ...
Hasan, Rashed Md. Murad   +2 more
openaire   +6 more sources

Photocatalytic Lithography [PDF]

open access: yesApplied Sciences, 2019
Patterning, the controlled formation of ordered surface features with different physico-chemical properties, is a cornerstone of contemporary micro- and nanofabrication. In this context, lithographic approaches owe their wide success to their versatility and their relative ease of implementation and scalability.
Guido Panzarasa, Guido Soliveri
openaire   +2 more sources

Direct X-ray and electron-beam lithography of halogenated zeolitic imidazolate frameworks

open access: yesNature Materials, 2020
Metal–organic frameworks (MOFs) offer disruptive potential in micro- and optoelectronics because of the unique properties of these microporous materials. Nanoscale patterning is a fundamental step in the implementation of MOFs in miniaturized solid-state
M. Tu   +16 more
semanticscholar   +1 more source

An Innovative Method to Improve Model Accuracy by Implementing Multi-models Scheme for 28nm Node and Below

open access: yesJournal of Microelectronic Manufacturing, 2019
As the process comes into 28nm node and below, lithography struggles stronger between high resolution (high NA) and enough process window especially for hole layers (Contacts and Vias). Taking more care of process window may result in lower image quality
Qingchen Cao   +3 more
doaj   +1 more source

Lithography-Based Fabricated Capacitive Pressure Sensitive Touch Sensors for Multimode Intelligent HMIs

open access: yesIEEE Access, 2023
Interdigitated capacitive (IDC) sensors have been extensively researched for human-machine interfaces (HMIs) due to consistent response and easy manufacturing.
Muhammad Qasim Mehmood   +7 more
doaj   +1 more source

On the Relationship between Resolution Enhancement and Multiphoton Absorption Rate in Quantum Lithography [PDF]

open access: yes, 2007
The proposal of quantum lithography [Boto et al., Phys. Rev. Lett. 85, 2733 (2000)] is studied via a rigorous formalism. It is shown that, contrary to Boto et al.'s heuristic claim, the multiphoton absorption rate of a ``NOON'' quantum state is actually ...
A. Leon-Garcia   +6 more
core   +2 more sources

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