Results 41 to 50 of about 223,528 (342)
Dual field alignment display and control for electron micropattern generator [PDF]
, 1972 Application of electron beam lithography to replace photolithography process in fabrication of integrated circuits is discussed. Procedure for using electron beam lithography equipment is described.
Malmberg, P. R., Okeeffe, T. W.
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On the efficiency of quantum lithography
, 2011 Quantum lithography promises, in principle, unlimited feature resolution, independent of wavelength. However, in the literature at least two different theoretical descriptions of quantum lithography exist. They differ in to which extent they predict that
Born M +9 more
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Quantum Emitters in Hexagonal Boron Nitride: Principles, Engineering and Applications
Advanced Functional Materials, EarlyView.Quantum emitters in hexagonal boron nitride have emerged as a promising candidate for quantum information science. This review examines the fundamentals of these quantum emitters, including their level structures, defect engineering, and their possible chemical structures.
Thi Ngoc Anh Mai +8 more
wiley +1 more source
Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network
Journal of Microelectronic Manufacturing, 2018 In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process.
Xingyu Zhou, Youling Yu
doaj +1 more source
Synchrotron Radiation for Quantum Technology
Advanced Functional Materials, EarlyView.Materials and interfaces underpin quantum technologies, with synchrotron and FEL methods key to understanding and optimizing them. Advances span superconducting and semiconducting qubits, 2D materials, and topological systems, where strain, defects, and interfaces govern performance.
Oliver Rader +10 more
wiley +1 more source
Micromachines, 2020 This paper presents a microlens fabrication process using the timed-development-and-thermal-reflow process, which can fabricate various types of aperture geometry with a parabolic profile on a single substrate in the same batch of the process.
Jun Ying Tan +2 more
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, 2017 We investigate zero-bias conductance peaks that arise from coalescing subgap Andreev states, consistent with emerging Majorana zero modes, in hybrid semiconductor-superconductor wires defined in a two-dimensional InAs/Al heterostructure using top-down ...
Hamilton, Alexander R. +6 more
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Advanced Functional Materials, EarlyView.An all‐in‐one analog AI accelerator is presented, enabling on‐chip training, weight retention, and long‐term inference acceleration. It leverages a BEOL‐integrated CMO/HfOx ReRAM array with low‐voltage operation (<1.5 V), multi‐bit capability over 32 states, low programming noise (10 nS), and near‐ideal weight transfer.
Donato Francesco Falcone +11 more
wiley +1 more source
Green Nanofabrication Opportunities in the Semiconductor Industry: A Life Cycle Perspective
Nanomaterials, 2021 The turn of the 21st century heralded in the semiconductor age alongside the Anthropocene epoch, characterised by the ever-increasing human impact on the environment.
Eleanor Mullen, Michael A. Morris
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Suppression of quantum noises in coherent atom lithography through squeezing
, 2017 The Abbe's diffraction limit restricts the resolution of an optical imaging and lithography system. Coherent Rabi oscillation is shown to be able to overcome the diffraction limit in both optical and atom lithography.
Chen, Rongxin +3 more
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