Results 41 to 50 of about 299,640 (375)
Temperature Fluctuation Attenuation of Circulating Cooling Water Using Dynamic Thermal Filtering
Applied Sciences, 2020 The Demand for circulating cooling water (CCW) with high temperature stability and a quick response to temperature control is essential for precision engineering, so a dynamic thermal filtering method is proposed in this paper.
Yesheng Lu +4 more
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Layout Decomposition for Quadruple Patterning Lithography and Beyond
, 2014 For next-generation technology nodes, multiple patterning lithography (MPL) has emerged as a key solution, e.g., triple patterning lithography (TPL) for 14/11nm, and quadruple patterning lithography (QPL) for sub-10nm. In this paper, we propose a generic
Pan, David Z., Yu, Bei
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Characterisation of slow light in a waveguide grating [PDF]
, 2006 A grating was defined in a silicon nitride waveguide, using a combination of both conventional lithography and laser interference lithography. The structure was optically characterized in the 1520 – 1560 nm wavelength range by combining transmission ...
Hoekstra, Hugo J.W.M. +2 more
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Molecules, 2013 In this article we present several developed and improved combinatorial techniques to optimize processing conditions and material properties of organic thin films. The combinatorial approach allows investigations of multi-variable dependencies and is the
Hans-Werner Schmidt +4 more
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Enhancement of optical response in nanowires by negative-tone PMMA lithography
, 2018 The method of negative-tone-PMMA electron-beam lithography is investigated to improve the performance of nanowire-based superconducting detectors. Using this approach, the superconducting nanowire single-photon detectors (SNSPDs) have been fabricated ...
Agarwal, Akshay +3 more
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Nanocube Imprint Lithography [PDF]
ACS Nano, 2020 In recent years, imprint lithography has emerged as a promising patterning technique capable of high-speed and volume production. In this work, we report highly reproducible one-step printing of metal nanocubes. A dried film of monocrystalline silver cubes serves as the resist, and a soft polydimethylsiloxane stamp directly imprints the final pattern ...
Harshal Agrawal, Erik C. Garnett
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Microphotonic parabolic light directors fabricated by two-photon lithography [PDF]
, 2011 We have fabricated microphotonic parabolic light directors using two-photon lithography, thin-film processing, and aperture formation by focused ion beam lithography. Optical transmission measurements through upright parabolic directors 22 μm high and 10
Atwater, H. A. +8 more
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Applied Physics Letters, 2004 Direct write atom lithography is a technique in which nearly resonant light is used to pattern an atom beam. Nanostructures are formed when the patterned beam falls onto a substrate. We have applied this lithography scheme to a ferromagnetic element, using a 372nm laser light standing wave to pattern a beam of iron atoms.
te E Edwin Sligte +6 more
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Results in Physics, 2020 In this study, Cu2ZnSnS4 (CZTS) nanoparticles with an average size in a range of 10–36 nm were synthesized via solvothermal synthesis using different amounts of polyvinylpyrrolidone (PVP, 3, 5, 7, and 9 mg/mL) stabilizing agent.
E.M. Mkawi +3 more
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Hotspot Detection of Semiconductor Lithography Circuits Based on Convolutional Neural Network
Journal of Microelectronic Manufacturing, 2018 In the advanced semiconductor lithography manufacturing process, the sub-wavelength lithography gap may cause lithographic error and the difference between the wafer pattern and mask pattern which may cause wafer defects in the later process.
Xingyu Zhou, Youling Yu
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