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Introduction to magnetron sputtering

open access: yes, 2020
Plasma-based physical vapor deposition (PVD) methods have found widespread use in various industrial applications. In plasma-based PVD processes, the deposition species are either vaporized by thermal evaporation or by sputtering from a source (the ...
Jon Tomas Gudmundsson, Daniel Lundin
semanticscholar   +3 more sources
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Magnetron sputtering

Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020
Magnetron sputtering developed rapidly in the 1980s for semiconductor, hard coating, and architectural glass applications. While the general operating principles were well known, subtle issues relating to cathode material, operating parameters, and deposition processes were only empirically understood. A sequence of magnetron measurements is described,
S. Rossnagel
semanticscholar   +3 more sources

Recent advances in magnetron sputtering

Surface and Coatings Technology, 1999
The paper will outline the historical development of sputtering techniques up to the recent development of closed-field unbalanced magnetron sputtering (CFUBMS). Examples will then be given of the use of CFUBMS to develop advanced coatings for industrial applications, including corrosion resistant coatings for aerospace, hard ceramic coatings for wear ...
R D Arnell, P J Kelly
exaly   +2 more sources

Magnetron sputtering deposition of silicon nitride on polyimide separator for high-temperature lithium-ion batteries

Journal of Energy Chemistry, 2021
To date, lithium-ion batteries are becoming increasingly significant in the application of portable devices and electrical vehicles, and revolutionary progress in theoretical research and industrial application has been achieved.
Canhui Liao   +8 more
semanticscholar   +1 more source

Magnetron sputtering enabled sustainable synthesis of nanomaterials for energy electrocatalysis

, 2021
Next-generation energy technologies have captured increasing research interest because of their fascinating advantages, yet the implementation of such technologies requires efficient and robust electrocatalysts to overcome the sluggish heart reaction ...
Jie Liang   +8 more
semanticscholar   +1 more source

Microstructure and high-temperature steam oxidation properties of thick Cr coatings prepared by magnetron sputtering for accident tolerant fuel claddings: The role of bias in the deposition process

, 2020
Thick Cr coatings sized ∼27 μm were deposited on Zr-4 substrates by magnetron sputtering to improve the high-temperature oxidation resistance of Zr alloys for accident tolerant fuel claddings.
Q. Chen   +11 more
semanticscholar   +1 more source

Magnetron-sputtered amorphous silicon

Journal of Applied Physics, 1985
The optical properties of undoped α-Si:H films prepared using magnetron sputtering at different deposition conditions were studied by measuring their transmittance and reflectance between λ=0.25 and λ=1.5 μm and their thickness. The extracted optical constants are interpreted to give values of the band gap.
DEMICHELIS F.   +3 more
openaire   +2 more sources

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