Results 201 to 210 of about 15,883 (266)
Antibacterial coating of orthodontic elastomeric ligatures with silver and bismuth nanofilms by magnetron sputtering: A feasibility study. [PDF]
Clin Exp Dent ResSchubert A +5 more
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Tuning the optical, electrical, and structural properties of Cu-DLC thin films via simultaneous DC-RF unbalanced magnetron sputtering. [PDF]
HeliyonMikhchin A +4 more
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Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2020
Magnetron sputtering developed rapidly in the 1980s for semiconductor, hard coating, and architectural glass applications. While the general operating principles were well known, subtle issues relating to cathode material, operating parameters, and deposition processes were only empirically understood. A sequence of magnetron measurements is described,
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Magnetron sputtering developed rapidly in the 1980s for semiconductor, hard coating, and architectural glass applications. While the general operating principles were well known, subtle issues relating to cathode material, operating parameters, and deposition processes were only empirically understood. A sequence of magnetron measurements is described,
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Magnetron-sputtered amorphous silicon
Journal of Applied Physics, 1985The optical properties of undoped α-Si:H films prepared using magnetron sputtering at different deposition conditions were studied by measuring their transmittance and reflectance between λ=0.25 and λ=1.5 μm and their thickness. The extracted optical constants are interpreted to give values of the band gap.
DEMICHELIS F. +3 more
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Journal of Vacuum Science and Technology, 1978
The technology is reviewed with emphasis on implementation. PM sputtering is characterized by cathode potentials of 300–700 V and sputtering gas pressures of 1-15 mTorr (0.1–2 Pa). Deposition rates are proportional to power density, which in turn is primarily limited by the thermal conductivity and cooling efficiency of the target.
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The technology is reviewed with emphasis on implementation. PM sputtering is characterized by cathode potentials of 300–700 V and sputtering gas pressures of 1-15 mTorr (0.1–2 Pa). Deposition rates are proportional to power density, which in turn is primarily limited by the thermal conductivity and cooling efficiency of the target.
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Magnetron sputtering of Cu55Ni45
Vacuum, 1984Abstract We present some preliminary results on the variation of the properties of sputtered Cu55Ni45 alloy films as a function of deposition conditions. The films were prepared on Pyrex substrates in a uhv getter sputter deposition system using a small-scale dc magnetron source. Deposition rates were of order of 1 nms−1. The sputtering gas pressure,
ZH Barber, RE Somekh
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Combinatorial Magnetron Sputtering
Vakuum in Forschung und Praxis, 2017SummaryCombinatorial Magnetron Sputtering is a process where large numbers of chemically distinct thin film samples can be made in a single deposition. Utilizing a multiple cathode sputter system manufactured by the Kurt J. Lesker Company, researchers at the California Institute of Technology have developed a process which enables them to make 5,000 ...
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Optical Interference Coatings, 1995
Sputtering has become an extremely important and widespread manufacturing process for depositing optical interference coatings. This is due to a number of factors, including the excellent control sputtering offers over deposition rates and film properties, as well as the relative ease of scaling processes to large coating systems. Today there is a very
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Sputtering has become an extremely important and widespread manufacturing process for depositing optical interference coatings. This is due to a number of factors, including the excellent control sputtering offers over deposition rates and film properties, as well as the relative ease of scaling processes to large coating systems. Today there is a very
openaire +1 more source