Results 201 to 210 of about 255,948 (257)
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Journal of Alloys and Compounds, 2019
Transition metal nitrides become promising electrode materials for supercapacitors due to high chemical stability and electrical conductivity. This study reports a facile (one step) and green (mixed atmosphere of argon and nitrogen without any external ...
Zhengbing Qi +4 more
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Transition metal nitrides become promising electrode materials for supercapacitors due to high chemical stability and electrical conductivity. This study reports a facile (one step) and green (mixed atmosphere of argon and nitrogen without any external ...
Zhengbing Qi +4 more
semanticscholar +1 more source
Vacuum, 2019
Optimal target-sputtering mode for Aluminum Nitride thin film deposition by high power pulse magnetron sputtering (HPPMS)
D. Ma +6 more
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Optimal target-sputtering mode for Aluminum Nitride thin film deposition by high power pulse magnetron sputtering (HPPMS)
D. Ma +6 more
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Current applied physics, 2019
A comparative study has been carried on the role of balanced magnetron (BM) and unbalanced magnetron (UBM) sputtering processes on the properties of SnO2 thin films. The oxygen partial pressure, substrate temperature and deposition pressure were kept 20%,
G. Shanker +3 more
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A comparative study has been carried on the role of balanced magnetron (BM) and unbalanced magnetron (UBM) sputtering processes on the properties of SnO2 thin films. The oxygen partial pressure, substrate temperature and deposition pressure were kept 20%,
G. Shanker +3 more
semanticscholar +1 more source
Tutorial: Hysteresis during the reactive magnetron sputtering process
Journal of Applied Physics, 2018Reactive magnetron sputtering is a well-established physical vapor technique to deposit thin compound films on different substrates, ranging from insulating glass windows over wear-resistant car parts to high-responsive touch screens.
K. Strijckmans, R. Schelfhout, D. Depla
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Combinatorial Magnetron Sputtering
Vakuum in Forschung und Praxis, 2017SummaryCombinatorial Magnetron Sputtering is a process where large numbers of chemically distinct thin film samples can be made in a single deposition. Utilizing a multiple cathode sputter system manufactured by the Kurt J. Lesker Company, researchers at the California Institute of Technology have developed a process which enables them to make 5,000 ...
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Journal of Nuclear Materials, 2018
TiN coatings have been deposited on Zr-4 substrates using direct current (DC) magnetron sputtering and the effects of roughness of substrate and sputtering power on the microstructure, thickness/deposition rate, adhesion properties and residual stress of
W. Xiao +8 more
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TiN coatings have been deposited on Zr-4 substrates using direct current (DC) magnetron sputtering and the effects of roughness of substrate and sputtering power on the microstructure, thickness/deposition rate, adhesion properties and residual stress of
W. Xiao +8 more
semanticscholar +1 more source
Dual-anode magnetron sputtering
Surface and Coatings Technology, 2003Abstract Reactive sputtering of dielectrics suffers from an anode problem, which appears when the anode becomes coated with a dielectric layer. A solution to the anode problem is a self-cleaning anode system. It can consist of two anodes and a single magnetron driven by a mid-frequency AC power supply via a center-taped transformer.
A Belkind, Z Zhao, R Scholl
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Reactive magnetron sputtering of ZnO
Journal of Applied Physics, 1981A planar magnetron with a zinc target is used to sputter zinc oxide in an oxygen atmosphere. Highly oriented zinc oxide films are obtained on a variety of subtrates such as gold, aluminum, platinum, quartz, and oxidized silicon. The sputtering rate is typically 10–20 μm/h for a substrate temperature of 450–500 °C, a substrate-to-target spacing of 4–7 ...
B. T. Khuri-Yakub +2 more
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Optical Interference Coatings, 1995
Sputtering has become an extremely important and widespread manufacturing process for depositing optical interference coatings. This is due to a number of factors, including the excellent control sputtering offers over deposition rates and film properties, as well as the relative ease of scaling processes to large coating systems. Today there is a very
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Sputtering has become an extremely important and widespread manufacturing process for depositing optical interference coatings. This is due to a number of factors, including the excellent control sputtering offers over deposition rates and film properties, as well as the relative ease of scaling processes to large coating systems. Today there is a very
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Sputtering magnetron experiments and modeling
1990 Plasma Science IEEE Conference Record - Abstracts, 1990Summary form only given. Global plasma behavior was characterized experimentally for a cylindrically symmetric planar magnetron with a Cu cathode located above a set of permanent magnets, yielding a trap with a major radius of 1.7 cm. It was found that the electron confinement time was a1 ms for argon and that this is regulated by the transit time of ...
J. Goree, M.J. Goeckner, T.E. Sheridan
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