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Magnetron sputtering: basic physics and application to cylindrical magnetrons
Journal of Vacuum Science and Technology, 1978 Magnetron sputtering sources can be defined as diode devices in which magnetic fields are used in concert with the cathode surface to form electron traps which are so configured that the E×B electron-drift currents close on themselves. Coaxial cylindrical magnetron sputtering sources in which post or hollow cathodes are operated in axial magnetic ...openaire +1 more sourceMagnetron Sputtering
2012 Gabriela Juarez-Martinez, Alessandro Chiolerio, Paolo Allia, Martino Poggio, Christian L. Degen, Li Zhang, Bradley J. Nelson, Lixin Dong, Mitsumasa Iwamoto, Markus J. Buehler, Graham Bratzel, Farghalli A. Mohamed, Nathan Doble, Alok Govil, Ion Bita, Evgeni Gusev, Jung-Tang Huang, Kuo-Yu Lee, Hou-Jun Hsu, Pen-Shan Chao, Chung-Yi Lin, Jit Muthuswamy, Murat Okandan, Donald P. Butler, Zeynep Celik-Butler, Bongsang Kim, Woo-Tae Park, Anisullah Baig, Diana Gamzina, Jinfeng Zhao, Youngmin Shin, Robert Barchfeld, Larry R. Barnett, Calvin Domier, Neville C. Luhmann, Yitzhak Rosen, Pablo Gurman, Craig Snoeyink, Steven T. Wereley, Ranajay Ghosh, Aloke Kumar, Partha P. Mukherjee, Seonghwan Kim, Thomas Thundat, Ashwini Gopal, Kazunori Hoshino, John Xiaojing Zhang, Takahito Ono, Masayoshi Esashi, Soichiro Tsuda, Ryan M. Pocratsky, Maarten P. Boer, Shawn Litster, Clifford W. Padgett, Tad S. Whiteside, Luigi Preziosi, Soichiro Tsuda, Melissa A. Pasquinelli, Yaroslava G. Yingling, Yunfeng Shi, Stuart A. Boden, Darren M. Bagnall, Rita E. Serda, Mauro Ferrari +63 moreopenaire +1 more source
