Results 191 to 200 of about 255,948 (257)
Some of the next articles are maybe not open access.

The influence of nitrogen on the morphology of ZrN coatings deposited by magnetron sputtering

, 2020
ZrN coatings with the thickness of about 3 μm were deposited on hardened steel substrates by reactive magnetron sputtering at the constant magnetron power of 700 W and at the substrate bias voltage about − 10 V with different nitrogen flow rate from 3 to
T. Kuznetsova   +5 more
semanticscholar   +1 more source

Simple fabrication of the Ag-Ag2O-TiO2 photocatalyst thin films on polyester fabrics by magnetron sputtering and its photocatalytic activity

, 2020
The polyester fabrics were modified with Ag-Ag2O-TiO2 coating. The TiO2 layer was prepared by DC magnetron sputtering and oxidation in air: a method which avoids the problem of Ti target poisoning in reactive sputtering.
Hua-Liang Yu   +9 more
semanticscholar   +1 more source

Chromium coatings deposited by cooled and hot target magnetron sputtering for accident tolerant nuclear fuel claddings

, 2020
The paper describes the oxidation of E110 alloy with Cr coatings in air atmosphere at 1100 °C for 20 min. The coatings were deposited using magnetron sputtering systems of the classical construction (with cooled targets in a dual configuration) and with ...
E. Kashkarov   +4 more
semanticscholar   +1 more source

High transmittance β-Ga2O3 thin films deposited by magnetron sputtering and post-annealing for solar-blind ultraviolet photodetector

Journal of Alloys and Compounds, 2019
Monoclinic Ga2O3 (β-Ga2O3) thin films were deposited on c-plane sapphire substrates via radio frequency magnetron sputtering method followed by post-annealing process. The structural and optical properties of β-Ga2O3 films deposited at various sputtering
Jiang Wang   +6 more
semanticscholar   +1 more source

Magnetron sputtering enabled synthesis of nanostructured materials for electrochemical energy storage

, 2020
Batteries and supercapacitors are promising candidates for electrochemical energy storage while the development of their electrode materials is becoming a bottleneck.
Fengyi Wang   +9 more
semanticscholar   +1 more source

Planar Magnetron Sputtering

Journal of Vacuum Science and Technology, 1978
The technology is reviewed with emphasis on implementation. PM sputtering is characterized by cathode potentials of 300–700 V and sputtering gas pressures of 1-15 mTorr (0.1–2 Pa). Deposition rates are proportional to power density, which in turn is primarily limited by the thermal conductivity and cooling efficiency of the target.
openaire   +1 more source

Recent Advances in Magnetron Sputtering: From Fundamentals to Industrial Applications

Coatings
Magnetron Sputter Vacuum Deposition (MSVD) has undergone significant advancements since its inception. This review explores the evolution of MSVD, encompassing its fundamental principles, various techniques (including reactive sputtering, pulsed ...
P. Borowski, Jarosław Myśliwiec
semanticscholar   +1 more source

Investigation of structure and mechanical properties of TiZrHfNiCuCo high entropy alloy thin films synthesized by magnetron sputtering

Journal of Alloys and Compounds, 2019
Nano-composite-structured thin films reinforced by two phases, such as a nanocrystallite TiN phase distributed in an amorphous Si3N4 matrix, have received increasing attention due to their extraordinary mechanical properties.
Young Seok Kim   +11 more
semanticscholar   +1 more source

Magnetron sputtering of Cu55Ni45

Vacuum, 1984
Abstract We present some preliminary results on the variation of the properties of sputtered Cu55Ni45 alloy films as a function of deposition conditions. The films were prepared on Pyrex substrates in a uhv getter sputter deposition system using a small-scale dc magnetron source. Deposition rates were of order of 1 nms−1. The sputtering gas pressure,
ZH Barber, RE Somekh
openaire   +1 more source

Optical properties of amorphous Ta2O5 thin films deposited by RF magnetron sputtering

Optical materials (Amsterdam), 2019
Optical properties including refractive indices, extinction coefficient, thickness and both optical direct and indirect band gaps of the Ta2O5 thin films deposited by RF magnetron sputtering were determined in this work. The influence of sputtering power,
Xinyi Chen, Rui-Xue Bai, Meidong Huang
semanticscholar   +1 more source

Home - About - Disclaimer - Privacy