Results 1 to 10 of about 50,856 (266)

Silicon Conical Structures by Metal Assisted Chemical Etching [PDF]

open access: yesMicromachines, 2020
A simple and inexpensive method to obtain Si conical structures is proposed. The method consists of a sequence of steps that include photolithography and metal assisted chemical etching (MACE) to create porous regions that are dissolved in a post-etching
Oscar Pérez-Díaz   +1 more
doaj   +4 more sources

Silicon Nanowires Synthesis by Metal-Assisted Chemical Etching: A Review [PDF]

open access: yesNanomaterials, 2021
Silicon is the undisputed leader for microelectronics among all the industrial materials and Si nanostructures flourish as natural candidates for tomorrow’s technologies due to the rising of novel physical properties at the nanoscale.
Antonio Alessio Leonardi   +2 more
doaj   +5 more sources

Optimization of Metal-Assisted Chemical Etching for Deep Silicon Nanostructures [PDF]

open access: yesNanomaterials, 2021
High-aspect ratio silicon (Si) nanostructures are important for many applications. Metal-assisted chemical etching (MACE) is a wet-chemical method used for the fabrication of nanostructured Si.
Rabia Akan, Ulrich Vogt
doaj   +5 more sources

Bio-Inspired Hierarchical Micro-/Nanostructures for Anti-Icing Solely Fabricated by Metal-Assisted Chemical Etching [PDF]

open access: yesMicromachines, 2022
We report a cost-effective and scalable methodology for producing a hierarchical micro-/nanostructured silicon surface solely by metal-assisted chemical etching. It involves two major processing steps of fabricating micropillars and nanowires separately.
Lansheng Zhang   +4 more
doaj   +2 more sources

Metal-Assisted Chemical Etching for Anisotropic Deep Trenching of GaN Array [PDF]

open access: yesNanomaterials, 2021
Realizing the anisotropic deep trenching of GaN without surface damage is essential for the fabrication of GaN-based devices. However, traditional dry etching technologies introduce irreversible damage to GaN and degrade the performance of the device. In
Qi Wang   +7 more
doaj   +2 more sources

Reduction of Nitroaromatics by Gold Nanoparticles on Porous Silicon Fabricated Using Metal-Assisted Chemical Etching [PDF]

open access: yesNanomaterials, 2023
In this study, we investigated the use of porous silicon (PSi) fabricated using metal-assisted chemical etching (MACE) as a substrate for the deposition of Au nanoparticles (NPs) for the reduction of nitroaromatic compounds.
Ling-Yi Liang   +3 more
doaj   +2 more sources

Microfabrication of X-ray Optics by Metal Assisted Chemical Etching: A Review [PDF]

open access: yesMicromachines, 2020
High-aspect-ratio silicon micro- and nanostructures are technologically relevant in several applications, such as microelectronics, microelectromechanical systems, sensors, thermoelectric materials, battery anodes, solar cells, photonic devices, and X ...
Lucia Romano, Marco Stampanoni
doaj   +2 more sources

Curved Structure of Si by Improving Etching Direction Controllability in Magnetically Guided Metal-Assisted Chemical Etching [PDF]

open access: yesMicromachines, 2020
Metal-assisted chemical etching (MACE) is widely used to fabricate micro-/nano-structured Si owing to its simplicity and cost-effectiveness. The technique of magnetically guided MACE, involving MACE with a tri-layer metal catalyst, was developed to ...
Tae Kyoung Kim   +6 more
doaj   +2 more sources

Kinked silicon nanowires-enabled interweaving electrode configuration for lithium-ion batteries [PDF]

open access: yesScientific Reports, 2018
A tri-dimensional interweaving kinked silicon nanowires (k-SiNWs) assembly, with a Ni current collector co-integrated, is evaluated as electrode configuration for lithium ion batteries.
Georgiana Sandu   +13 more
doaj   +3 more sources

Unraveling the Morphological Evolution and Etching Kinetics of Porous Silicon Nanowires During Metal-Assisted Chemical Etching [PDF]

open access: yesNanoscale Research Letters, 2017
Many potential applications of porous silicon nanowires (SiNWs) fabricated with metal-assisted chemical etching are highly dependent on the precise control of morphology for device optimization. However, the effects of key etching parameters, such as the
Lester U. Vinzons   +5 more
doaj   +2 more sources

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