Results 151 to 160 of about 6,729 (212)
Engineering of Interface Barrier in Hybrid MXene/GaN Heterostructures for Schottky Diode Applications. [PDF]
Majchrzak D +8 more
europepmc +1 more source
Alloying hBN with aluminum influences absorption and electronic properties. [PDF]
Iwański J +11 more
europepmc +1 more source
Direct investigation of localized leakage currents in GaN-on-sapphire pn-diodes. [PDF]
Kinstler AD +9 more
europepmc +1 more source
Nanoscale photonic artificial neuron with biological signal processing. [PDF]
Sestoft JE +10 more
europepmc +1 more source
Narrow-linewidth monolithic topological interface state extended laser with optical injection locking. [PDF]
Sun X +7 more
europepmc +1 more source
Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride. [PDF]
van der Wel BY +3 more
europepmc +1 more source
Quasi-thermodynamic analysis of MOVPE of AlGaN
A quasi-thermodynamic analysis of the MOVPE growth of AlxGa1-xN alloy using TMGa, TMA1 and ammonia has been proposed. The effect of varying growth conditions (growth temperature, reactor pressure, input V/III ratio, hydrogen pressure fraction in the ...
Da‐Cheng Lu
exaly +1 more source
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Progress in Crystal Growth and Characterization of Materials, 1997
Abstract The development of II–VI MOVPE is reviewed, contrasting the narrow bandgap materials with the wide bandgap. Common issues are the need to grow the layers at lower temperatures than their III–V cousins in order to avoid point defects. This means that II–VI MOVPE occurs in a surface kinetic regime for precursor decomposition and has stimulated
S J C IRVINE +4 more
openaire +1 more source
Abstract The development of II–VI MOVPE is reviewed, contrasting the narrow bandgap materials with the wide bandgap. Common issues are the need to grow the layers at lower temperatures than their III–V cousins in order to avoid point defects. This means that II–VI MOVPE occurs in a surface kinetic regime for precursor decomposition and has stimulated
S J C IRVINE +4 more
openaire +1 more source
Semiconductor Science and Technology, 1991
The critical steps in the development of MOVPE for the fabrication of MCT focal plane arrays (FPAs) are outlined. Improved purity of the source organometallics has enabled background donor concentrations in the mid 1014 cm-3 to be achieved, together with controlled back doping with donors or acceptors.
S J C Irvine +4 more
openaire +1 more source
The critical steps in the development of MOVPE for the fabrication of MCT focal plane arrays (FPAs) are outlined. Improved purity of the source organometallics has enabled background donor concentrations in the mid 1014 cm-3 to be achieved, together with controlled back doping with donors or acceptors.
S J C Irvine +4 more
openaire +1 more source

