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Neutral interface traps for Negative Bias Temperature Instability
2011 International Reliability Physics Symposium, 2011Negative Bias Temperature Instability (NBTI) is a critical reliability issue and becoming more and more seriously in the modern CMOS technology. Many models have been proposed to account for the NBTI phenomena, but most of the models are based on the popular hydrogen reaction-diffusion (R-D) mechanisms.
Z. Chen +3 more
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Temperature stabilization for negative bias temperature instability
2012Previous research was conducted on a Complementary Metal Oxide Semiconductor (CMOS) to determine the impact of a phenomenon known as Negative Bias Temperature Instability (NBTI). NBTI affects the operational characteristics of these devices, with a stronger effect on p-channel devices.
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Negative Bias Temperature Instability in (Si)Ge pMOSFETs
2013A comprehensive analysis of the NBTI reliability of SiGe channel pMOSFETs is reported in this chapter. First the impact of individual gate stack parameters on the device reliability is discussed. The experimental learning is then combined to propose a reliability-oriented gate stack optimization, which is shown to enable ultrathin EOT devices with ...
Jacopo Franco +2 more
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Role of Hydrogen in Negative-Bias Temperature Instability
Extended Abstracts of the 2002 International Conference on Solid State Devices and Materials, 2002Jiro Ushio +3 more
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Negative-Bias Temperature Instability of p-GaN Gate GaN-on-Si Power Devices
IEEE Transactions on Device and Materials Reliability, 2022Wen Yang, Jiann Shiun Yuan
exaly
Negative bias temperature instability (NBTI) experiment
2012The phenomenon known as Negative Bias Temperature Instability (NBTI) impacts the operational characteristics of Complementary Metal Oxide Semiconductor (CMOS) devices, and tends to have a stronger effect on p-channel devices. This instability is observed with an applied "on" biasing during normal operation and can be accelerated with thermal stress.
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Bias Temperature Instability of 4H-SiC p- and n-Channel MOSFETs Induced by Negative Stress at 200 °C
IEEE Transactions on Electron Devices, 2022Jilong Hao, Jiang Lu, Yun Bai
exaly
Lifetime Reliability Enhancement of Microprocessors
ACM Computing Surveys, 2015Sungho Kang, Jaeil Lim
exaly
The Negative Bias Temperature Instability in MOS Devices
2006 IEEE International Integrated Reliability Workshop Final Report, 2006openaire +1 more source

