Results 41 to 50 of about 3,478,957 (237)

Improved spatiotemporal resolution of anti-scattering super-resolution label-free microscopy via synthetic wave 3D metalens imaging

open access: yesOpto-Electronic Science, 2023
Super-resolution (SR) microscopy has dramatically enhanced our understanding of biological processes. However, scattering media in thick specimens severely limits the spatial resolution, often rendering the images unclear or indistinguishable ...
Yuting Xiao   +7 more
doaj   +1 more source

Using an Auxiliary Mach–Zehnder Interferometer to Compensate for the Influence of Laser-Frequency-Drift in Φ-OTDR

open access: yesIEEE Photonics Journal, 2019
In phase-sensitive optical time-domain reflectometry (Φ-OTDR), the frequency drift of the laser source induces the fluctuation of signal, which limits the measurement capacity of Φ-OTDR for low frequency severely.
Quan Yuan   +4 more
doaj   +1 more source

All-Optical Manipulation of Magnetization in Ferromagnetic Thin Films Enhanced by Plasmonic Resonances.

open access: yesNano letters (Print), 2020
In this paper, we report all-optical manipulation of magnetization in ferromagnetic Co/Pt thin films enhanced by plasmonic resonances. By annealing a thin Au layer, we fabricate large-area Au nanoislands on top of the Co/Pt magnetic thin films, which ...
Feng Cheng   +6 more
semanticscholar   +1 more source

Localized optical manipulation in optical ring resonators

open access: yesOptics Express, 2015
We propose a tunable optical trapping system for nanoparticles based on generating standing wave by coupling two coherent beams into a ring resonator in opposite directions, respectively. The distributions of the mode field excited in three types of the ring-resonators-based trapping systems (microring, microdisk and slot ring) and the corresponding ...
Haotian, Wang, Xiang, Wu, Deyuan, Shen
openaire   +2 more sources

An Autonomous Global Star Identification Algorithm Based on the Fast MST Index and Robust Multi-Order CCA Pattern

open access: yesRemote Sensing, 2023
Star identification plays a key role in spacecraft attitude measurement. Currently, most star identification algorithms tend to perform well only in a scene without noise and are highly sensitive to noise.
Zijian Zhu   +7 more
doaj   +1 more source

Fast Optical pH Manipulation and Imaging

open access: yesAnalytical Chemistry, 2012
We describe a complete system for optical pH manipulation and imaging. The system consists of a photoactive Ruthenium complex capable of inducing a change of more than 5 pH units at the nanosecond time scale. A compatible imaging system acquires microscopic pH images at 1200 fps using a nonexpensive commercial digital camera and an LED illumination ...
Filevich, Oscar   +3 more
openaire   +3 more sources

Hybrid Inductively Coupled Plasma and Computer-Controlled Optical Surfacing Polishing for Rapid Fabrication of Damage-Free Ultra-Smooth Surfaces

open access: yesMicromachines
The polymer deposition layer (PDL) formed during inductively coupled plasma (ICP) processing significantly limits the figuring accuracy and surface quality of fused silica optics.
Wei Li   +7 more
doaj   +1 more source

Manipulation of nonlinear optical responses in layered ferroelectric niobium oxide dihalides

open access: yesNature Communications, 2023
Realization of highly tunable second-order nonlinear optical responses, e.g., second-harmonic generation and bulk photovoltaic effect, is critical for developing modern optical and optoelectronic devices.
Liangting Ye   +16 more
semanticscholar   +1 more source

Optimization Design Method of a 6-DOF Micromanipulation Mechanism for Extreme Ultraviolet Projection Lithography Objective Lens

open access: yesShock and Vibration
The six-degree-of-freedom (6-DOF) micromotion mechanism is a key component in extreme ultraviolet (EUV) projection lithography objectives to compensate for wavefront aberration and ensure performance stability.
Shiyu Li   +6 more
doaj   +1 more source

A Wafer Pre-Alignment Algorithm Based on Weighted Fourier Series Fitting of Circles and Least Squares Fitting of Circles

open access: yesMicromachines, 2023
The wafer pre-aligner is a crucial component in the lithography process to correct the wafer center and notch orientation. To improve the precision and the efficiency of pre-alignment, a new method to calibrate the center and the orientation of a wafer ...
Jingsong Chen   +5 more
doaj   +1 more source

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