Results 271 to 280 of about 21,020,521 (317)
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Degradation mechanism of Schottky P-GaN gate stack in GaN power devices under neutron irradiation

Applied Physics Letters, 2021
In this Letter, the degradation mechanism of Schottky p-type GaN (P-GaN) gate stack in GaN power devices under neutron irradiation is studied. After 1-MeV neutron irradiation at fluences of 6 × 1013 and 1 × 1014 neutron/cm2, device threshold voltage VTH ...
Ruize Sun   +4 more
semanticscholar   +1 more source

Si diffusion in p-GaN

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2004
The characteristics of p-type Mg-doped GaN films diffused with Si are studied. N-type conductivity is achieved, and the carrier mobility of diffused GaN is 90–150 cm2 V−1 s−1, higher than that of p-GaN but less than that of epitaxially grown n-GaN. The Mg acceptor states could become deep compensating defects, and the compensation ratio NA/ND is 0.3, 0.
C. J. Pan   +4 more
openaire   +1 more source

Post-growth enhancement pf p-GaN conductivity

The 17th Annual Meeting of the IEEELasers and Electro-Optics Society, 2004. LEOS 2004., 2004
The paper reports on the investigation an improvement of the p-type conductivity of Mg-doped GaN by creating Ga-vacancies in the lattice.
Karouta, F.   +3 more
openaire   +2 more sources

Incorporating the Dynamic Threshold Voltage Into the SPICE Model of Schottky-Type p-GaN Gate Power HEMTs

IEEE transactions on power electronics, 2021
The threshold voltage (VTH) of an enhancement-mode Schottky-type p-GaN gate high-electron-mobility transistor (HEMT) is found to have a special dependence on the drain bias.
Han Xu   +5 more
semanticscholar   +1 more source

Ohmic contacts on p-GaN (Part I):

Materials Science in Semiconductor Processing, 2001
Abstract The changes in contact resistivity and I–V curve linearity after annealing of Pd, Ni/Au, Cr/Au, Co/Au, Pt and Au contacts on p-GaN after tempering below and above 500°C have been investigated. CTLM-layered structures on p-GaN were thermally stressed and electrically analyzed.
Roland Wenzel   +2 more
openaire   +1 more source

IG- and VGS-Dependent Dynamic RON Characterization of Commercial High-Voltage p-GaN Gate Power HEMTs

IEEE transactions on industrial electronics (1982. Print), 2021
The dynamic on-resistance (rON) of two mainstream 600 V/650 V p-GaN gate power high-electron-mobility transistors (HEMTs) with Ohmic- and Schottky-type p-GaN gate contacts are characterized under the hard-switching condition and show strong dependences ...
Kailun Zhong   +6 more
semanticscholar   +1 more source

Development of Enhancement-Mode GaN p-FET With Post-Etch Wet Treatment on p-GaN Gate HEMT Epi-Wafer

IEEE Transactions on Electron Devices
Developing E-mode p-channel field-effect transistors (p-FETs) on the standard p-GaN gate HEMT epi-wafer is highly motivated to facilitate the realization of gallium nitride (GaN) complementary logic (CL) circuits and power-integrated circuits (PICs). The
Teng Li   +12 more
semanticscholar   +1 more source

Electrical Transport Properties of p-GaN

Japanese Journal of Applied Physics, 1996
Electrical transport properties of Mg-doped p-GaN grown by organometallic vapor phase epitaxy were studied between 100 and 700 K. Calculations using Fermi-Dirac statistigs were carried out, identifying the majority carrier to be holes over the whole temperature range considered. The acceptor level is 0.17 ± 0.01 eV.
Hisashi Nakayama   +5 more
openaire   +1 more source

ZnO Nanowire/p-GaN Heterojunction LEDs

MRS Proceedings, 2007
AbstractThis article reports forward and reverse biased emission in vertical ZnO nanowire/p-GaN heterojunction light emitting diodes (LEDs) grown out of solution on Mg-doped p-GaN films. The electroluminescence spectra under forward and reverse bias are distinctly different. Forward bias showed two peaks centered around 390 nm and 585 nm, while reverse
Heiko O. Jacobs   +3 more
openaire   +1 more source

Neutron irradiation effects in p-GaN

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena, 2006
Electrical properties, admittance, and microcathodoluminescence spectra are compared for p-GaN samples grown by hydride vapor phase epitaxy (HVPE) and by molecular beam epitaxy (MBE). The former are characterized by a high 300K hole concentration and a weak temperature dependence of conductivity.
A. Y. Polyakov   +12 more
openaire   +1 more source

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