Results 281 to 290 of about 560,798 (337)

Photorefractive phase mask

SPIE Proceedings, 2001
We propose and demonstrate a new method to fabricate volume phase mask in LiNbO 3 :Fe crystal by photorefractive effect, for the first time to our knowledge. First, we image an amplitude mask with corresponding intensity distribution at the incident face of a photorefractive LiNbO 3 :Fe crystal.
Haidong Wen, Simin Liu, Xinzheng Zhang, Ru Guo, Guoquan Zhang, Qian Sun, Jingjun Xu, Guangyin Zhang   +7 more
openaire   +1 more source

White-light photorefractive phase mask

Applied Optics, 2005
A volume photorefractive phase mask has been fabricated with incoherent white light from an incandescent source in LiNbO3:Fe self-defocusing photorefractive crystal for the first time, to our knowledge. It can guide and modulate a probe white light or a laser beam and can be used to transmit an incoherent dark image as the guided modes of the ...
Yuanmei, Gao, Simin, Liu, Ru, Guo, Xiaohua, Zhang, Yi, Lu   +4 more
openaire   +2 more sources

Interferometric characterization of phase masks

Applied Optics, 2003
We demonstrate a novel interferometric technique for highly accurate characterization of phase masks used in optical fiber grating fabrication. The principle of the measurement scheme is based on the analysis of the interference pattern formed between the first- and zero-order beams transmitted through or reflected from the grating under test.
Mikhail, Sumetsky, Yury, Dulashko, Tom P, White, Tim, Olsen, Paul S, Westbrook, Benjamin J, Eggleton   +5 more
openaire   +2 more sources

Pixelated phase-mask dynamic interferometer

SPIE Proceedings, 2004
We have demonstrated a new type of dynamic measurement system that is comprised of a micropolarizer array and can work with any type polarization interferometer to measure a variety of physical properties. The unique configuration overcomes many of the limitations of previous single frame, phase-shift interferometer techniques.
James Millerd, Neal Brock, John Hayes, Michael North-Morris, Brad Kimbrough, James Wyant   +5 more
openaire   +1 more source

Random Phase Data Masks: Fabrication Tolerances and Advantages of Four Phase Level Masks

Applied Optics, 1972
An analysis is presented of the intensity variations in the Fourier transform plane resulting from the use of a bilevel random phase mask for holographic data recording as suggested by Burckhardt. To maintain a fixed ratio of peak intensities between in-phase amplitude components and out-of-phase components for an imperfect phase mask, the permissible ...
W C, Stewart, A H, Firester, E C, Fox
openaire   +2 more sources

Trapezoidal phase mask coronagraph

Chinese Optics Letters, 2015
An angular trapezoidal phase mask used for a wideband coronagraph is proposed. The azimuthal phase of the mask is double-periodic and has both trapezoidal and constant parts in each period. This kind of continuous phase distribution can be employed to avoid the abrupt phase variation of the 6-level phase distribution we proposed previously.
Zichen Cao Zichen Cao, Qing Cao Qing Cao, Yajun Ge Yajun Ge, Rongfei Hu Rongfei Hu, Minning Zhu Minning Zhu   +4 more
openaire   +1 more source

Transparent phase shifting mask

International Technical Digest on Electron Devices, 2002
A transparent phase shifting mask has been demonstrated to improve the resolution of the conventional i-line stepper and to facilitate the fabrication of various deep submicron patterns for VLSI. This mask, having a single patterned layer of phase shifter, can be easily fabricated, and it is easy to inspect and repair compared to the conventional phase
H. Watanabe, Y. Todokoro, M. Inoue
openaire   +1 more source

Optically controlled imaging phase mask element

Optics Letters, 1996
We demonstrate a new optical element consisting of a phase mask made of a nonlinear material. The element uses the nonlinearity to produce an intensity-dependent lens that controls its imaging properties. We demonstrate this element by optically controlling the imaging of an array produced by a diffractive spot generator in direct contact with a thin ...
S D, Vartak, N M, Lawandy
openaire   +2 more sources

Phase calibration for attenuating phase-shift masks

SPIE Proceedings, 2006
A phase metrology pattern for attenuating phase masks. The phase error of this pattern can be determined to high accuracy by aerial image measurements. This pattern can be used to create an optical phase standard for calibrating phase metrology equipment for attenuated phase masks, or as a witness pattern on a product mask to verify the phase accuracy ...
Michael S. Hibbs, Timothy A. Brunner
openaire   +1 more source

Nanopatterning with conformable phase masks

Journal of Photochemistry and Photobiology A: Chemistry, 2004
Abstract This paper describes an approach for using conventional photoresist materials to pattern structures with dimensions as small as 50 nm. This method, known as near field phase shift lithography (NFPSL), is an experimentally simple approach to nanofabrication that relies on ultraviolet exposure of a layer of resist while it is in conformal ...
Maria, J, Jeon, S Jeon, Seokwoo, Rogers, JA   +2 more
openaire   +1 more source