Results 51 to 60 of about 17,195 (246)

Switchable Thermal Mid‐IR Conducting Polymer Antenna Arrays

Advanced Functional Materials, EarlyView.
This study presents switchable mid‐infrared plasmonic resonances in PEDOT antenna arrays. Their optical extinction peaks can be reversibly switched ‘OFF’ and ‘ON’ by tuning the polaronic charge carrier concentration via the polymer's redox state, offering modulation of optical responses in the thermal mid‐infrared range including around 10 µm ...
Pravallika Bandaru, Mohammad Shaad Ansari, Suraya Kazi, Dongqing Lin, Alexander Yu Polyakov, Magnus P. Jonsson   +5 more
wiley   +1 more source

MEASUREMENT OF MICROHARDNESS OF PHOTORESIST FILMS ON SILICON BY THE SCRATCHING METHOD

Приборы и методы измерений, 2016
In recent years new types of resist for nano and submicronic lithography are intensively developed. As perspective materials for resist various polymeric compositions on a basis thermally and mechanically resistant polymers are considered. The purpose of
D. I. Brinkevich, V. S. Prosolovich, Yu. N. Yankovski, S. A. Vabishchevich, N. V. Vabishchevich, V. E. Gaishun   +5 more
doaj   +1 more source

Deterministic hBN Bubbles as a Versatile Platform for Studies on Single‐Photon Emitters

Advanced Functional Materials, EarlyView.
Single‐photon emitters (SPEs) in hBN are promising for quantum technologies; however, in exfoliated samples their activation is required, limiting reproducibility of previous studies. This work introduces a large‐area MOVPE‐grown hBN platform that hosts SPEs without prior activation.
Piotr Tatarczak, Tomasz Fąs, Jan Pawłowski, Aleksandra Krystyna Dąbrowska, Jan Suffczyński, Mateusz Tokarczyk, Piotr Wróbel, Andrzej Wysmołek, Johannes Binder   +8 more
wiley   +1 more source

Intermediate Resistive State in Wafer‐Scale Vertical MoS2 Memristors Through Lateral Silver Filament Growth for Artificial Synapse Applications

Advanced Functional Materials, EarlyView.
In MOCVD MoS2 memristors, a current compliance‐regulated Ag filament mechanism is revealed. The filament ruptures spontaneously during volatile switching, while subsequent growth proceeds vertically through the MoS2 layers and then laterally along the van der Waals gaps during nonvolatile switching.
Yuan Fa, Milan Buttberg, Ke Ran, Rana Walied Ahmad, Dennis Braun, Lukas Völkel, Jimin Lee, Sofía Cruces, Bart Macco, Bárbara Canto, Holger Lerch, Thorsten Wahlbrink, Holger Kalisch, Michael Heuken, Andrei Vescan, Joachim Mayer, Zhenxing Wang, Ilia Valov, Stephan Menzel, Max C. Lemme   +19 more
wiley   +1 more source

Integration of Low‐Voltage Nanoscale MoS2 Memristors on CMOS Microchips

Advanced Functional Materials, EarlyView.
This article presents the first monolithic integration of nanoscale MoS2‐based memristors into the back‐end‐of‐line of foundry‐fabricated CMOS microchips in a one‐transistor‐one‐resistor (1T1R) architecture. The MoS2‐based 1T1R cells exhibit forming‐free, nonvolatile resistive switching with ultra‐low operating voltages, low cycle‐to‐cycle variability ...
Jimin Lee, Sofía Cruces, Xiaohua Liu, Yang Chen, Vasilis A. Maroufidis, Janghyun Jo, Lukas Völkel, Dennis Braun, Michael Möller, Leon Brackmann, Holger Kalisch, Michael Heuken, Andrei Vescan, Rafal E. Dunin‐Borkowski, Joachim Mayer, Stefan Wiefels, Max C. Lemme   +16 more
wiley   +1 more source

Programmable In‐Situ Interactions Between Resins and Photopolymerized Structures for Seamlessly Integrated Optical Manufacturing of Microlenses

Advanced Functional Materials, EarlyView.
This study presents a dynamic interaction between liquid resins and photopolymerized structures enabled by an in situ light‐writing setup. By controlling a three‐phase interface through localized photopolymerization, which provides physical confinement for the remaining uncured resin regions, the approach establishes a programmable pathway that ...
Kibeom Kim, Sangmin Oh, Kahyun Hur, Hyesung Cho   +3 more
wiley   +1 more source

UV-LIGA: From Development to Commercialization

Micromachines, 2014
A major breakthrough in UV-LIGA (Lithographie, Galvanoformung and Abformung) started with the use of epoxy-based EPON® SU-8 photoresist in the mid-1990s. Using this photoresist has enabled the fabrication of tall and high aspect ratio structures without
Grégoire Genolet, Hubert Lorenz
doaj   +1 more source

photoresist

, 2014
Citation: 'photoresist' in the IUPAC Compendium of Chemical Terminology, 3rd ed.; International Union of Pure and Applied Chemistry; 2006. Online version 3.0.1, 2019. 10.1351/goldbook.P04651 • License: The IUPAC Gold Book is licensed under Creative Commons Attribution-ShareAlike CC BY-SA 4.0 International for individual terms.
openaire   +1 more source

External Reflection From Two‐Photon Laser‐Printed Micromirrors Enables Photomechanical Actuation at a 90° Incident Angle

Advanced Functional Materials, EarlyView.
Light reflectance increases along incidence angle and transmittance significantly drops around 90‐degree incidence angle. Here, we report two‐photon laser printed micro mirrors that redirect the skimming light beam into normal light absorption. Using this technique, light‐driven micro walkers and grippers are demonstrated by using grazing incidence ...
Leilei Song, Jianfeng Yang, Hao Zeng
wiley   +1 more source

Using an SU-8 Photoresist Structure and Cytochrome C Thin Film Sensing Material for a Microbolometer

Sensors, 2012
There are two critical parameters for microbolometers: the temperature coefficient of resistance (TCR) of the sensing material, and the thermal conductance of the insulation structure.
Guo-Dung John Su, Chien-Jen Liao, Jian-Lun Lai   +2 more
doaj   +1 more source