Results 141 to 150 of about 17,992 (248)

Origin of Dark Current Robustness in Photomultiplication Organic Photodetectors Enabled by Ionic Conjugated Electron‐Blocking Layers

Advanced Materials, EarlyView.
Ionic conjugated polyelectrolyte electron‐blocking layers enable photomultiplication organic photodetectors with dark current robustness up to −10 V and external quantum efficiencies exceeding 3000%. Fowler–Nordheim tunneling, interfacial dipole, trap density of states, and noise analyses reveal how ionic conjugated polyelectrolytes suppress electron ...
Yelim Kang, Min Hun Jee, Shuai Zhang, Sang Heon Lee, Jung Min Ha, Xingchao Zhao, Xiaoling Ma, Huiseong Shin, Changhwan Shin, Soonyong Lee, Fujun Zhang, Jae Won Shim, Han Young Woo   +12 more
wiley   +1 more source

Improvement of Physical and Electrical Characteristics in 4H-SiC MOS Capacitors Using AlON Thin Films Fabricated via Plasma-Enhanced Atomic Layer Deposition. [PDF]

Materials (Basel)
Bai Z, Ding C, Guo Y, Luo M, Zhou Z, Gu L, Zhang Q, Ma H.   +7 more
europepmc   +1 more source

Two-dimensional BN buffer for plasma enhanced atomic layer deposition of Al₂O₃ gate dielectrics on graphene field effect transistors. [PDF]

Sci Rep, 2020
Snure M, Vangala SR, Prusnick T, Grzybowski G, Crespo A, Leedy KD.   +5 more
europepmc   +1 more source

Barrier‐Assisted Plasma Doping for Spatially Selective Resistance Engineering in MoS2 Transistors

Advanced Materials, EarlyView.
Barrier‐assisted NH3 plasma doping enables damage‐free, spatially selective carrier modulation in monolayer MoS2 transistors. An ultrathin pV3D3/Al2O3 protective‐dielectric stack acts as a chemical filter that allows NHx radicals to reach the MoS2 surface while blocking plasma damage. This process achieves a high electron concentration of 4.3 × 1013 cm−
Inseong Lee, Joonho Park, Seungsun Yoo, Seunghyun Yu, Mingu Kang, Seohak Park, Min Kyu Lee, Hyeongjin Lim, Dongyoung Kim, Kunwoo Roh, Sejin Kim, Kihyuk Kim, Wonbae Ahn, Kibum Kang, Yong‐Hoon Kim, Sung‐Yool Choi   +15 more
wiley   +1 more source

Relation Between Thickness and TFTs Properties of HfO₂ Dielectric Layer Synthesized by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel)
Chen Q, Fu W, Han J, Zhang X, Lien SY.
europepmc   +1 more source

Polymeric Sorbents as Energy‐Efficient Alternative to Cryogenic Distillation for Light Hydrocarbon Purification

Advanced Materials, EarlyView.
The transition from cryogenic distillation to polymeric sorbents for light hydrocarbon purification is crucial for energy and environmental sustainability. The polymeric sorbents are engineered to separate gas mixtures based on their specific properties.
Kelechi Festus, Ankit Mondal, Suman Mandal, Jazmine Aiya D. Marquez, Arnab Ghosh, Aishi Sikdar, Urme Podder, Ahana Sarkar, Qingsheng Wang, Hong‐Cai Zhou   +9 more
wiley   +1 more source

Tailoring Nickel Oxide Thin Films: Comparative Study of Oxidizing Agents in Thermal and Plasma-Enhanced Atomic Layer Deposition. [PDF]

ACS Omega
Hidrogo-Rico MA, Nedev N, Horley P, Mendívil MI, Castillo-Saenz J, Martínez-Guerra E, Juarez-Perez EJ, Aguirre-Tostado FS, Susarrey-Arce A, Martínez-Guerra E.   +9 more
europepmc   +1 more source

Precursor-surface interactions revealed during plasma-enhanced atomic layer deposition of metal oxide thin films by in-situ spectroscopic ellipsometry. [PDF]

Sci Rep, 2020
Kilic U, Mock A, Sekora D, Gilbert S, Valloppilly S, Melendez G, Ianno N, Langell M, Schubert E, Schubert M.   +9 more
europepmc   +1 more source

Programmable Functional Silicification of DNA Origami Nanostructures

Advanced Materials, EarlyView.
This work introduces additional functionality into silica‐coated DNA origami nanostructures using non‐standard silica precursors. A fluorescent precursor enables enhanced intracellular tracking, while a disulfide‐containing reagent yields redox‐responsive, degradable silica coatings.
Anna V. Baptist, Lasse Guericke, Philipp Mauker, Oliver Thorn‐Seshold, Amelie Heuer‐Jungemann   +4 more
wiley   +1 more source

Biocompatible Co-organic Composite Thin Film Deposited by VHF Plasma-Enhanced Atomic Layer Deposition at a Low Temperature. [PDF]

ACS Omega
Yeom WK, Lee JW, Bae JA, Sung DI, Kim T, Lee JH, Yeom GY.   +6 more
europepmc   +1 more source