Results 141 to 150 of about 23,511 (291)

Electrical characteristics of top-down ZnO nanowire transistors using remote plasma ALD

Top-down fabrication is used to produce ZnO nanowires by remote plasma atomic layer deposition over a SiO2 pillar and anisotropic dry etching. Nanowire field-effect transistors (FETs), with channel lengths in the range of 1.3–18.6 µm, are then fabricated
Masaud, T.B., Ashburn, P., Fang, Q., Gunn, R., Allen, M. W., Partridge, J., Clark, O.D., Sultan, S.M., Sun, K., Chong, H.M.H.   +9 more
core   +1 more source

Tuning the Testicular Microenvironment for Enhancing Human Sertoli Cells Maturation and Functionality In Vitro

Advanced Healthcare Materials, EarlyView.
An in vitro testicular model is developed by generating connective tissue equivalents from human dermal fibroblast‐derived microtissues and coupling them with human Sertoli cells or human Sertoli cell spheroids. This engineered microenvironment supports Sertoli cell maturation and functionality, providing a promising platform for studying human ...
Annachiara Scalzone, Giorgia Imparato, Chiara Ausilio, Valentina Mollo, Paolo Antonio Netti   +4 more
wiley   +1 more source

High-Performance GaN-Based Green Flip-Chip Mini-LED with Lattice-Compatible AlN Passivation Layer

Nanomaterials
The GaN-based green miniaturized light-emitting diode (mini-LED) is a key component for the realization of full-color display. Optimized passivation layers can alleviate the trapping of carriers by sidewall defects and are regarded as an effective way to
Jiahao Song, Lang Shi, Siyuan Cui, Lingyue Meng, Qianxi Zhou, Jingjing Jiang, Conglong Jin, Jiahui Hu, Kuosheng Wen, Shengjun Zhou   +9 more
doaj   +1 more source

Bottom-up plasma-enhanced atomic layer deposition of SiO₂ by utilizing growth inhibition using NH₃ plasma pre-treatment for seamless gap-fill process. [PDF]

Sci Rep, 2022
Choi Y, Kim T, Lee H, Park J, Park J, Ryu D, Jeon W.   +6 more
europepmc   +1 more source

Plasma-assisted atomic layer deposition of low temperature SiO2

, 2011
Atomic layer deposition (ALD) was used to deposit SiO2 films in the temperature range of 50-400 oC. H2Si[N(C2H5)2]2 and an O2 plasma were used as Si precursor and oxidant, respectively.
Sanden, MCM Richard van de, Helvoirt, van, C.A.A., Kessels, WMM Erwin, Dingemans, G., M.C.M. Van de Sanden, Sah, R., W. M. Kessels, Sanden, van de, M.C.M., Helvoirt, CAA van, Kessels, W.M.M., Gijs Dingemans, Cristian Van Helvoirt, Dingemans, G Gijs   +12 more
core   +1 more source

Microengineered Gradient Hydrogels for Mechanobiology

Advanced Healthcare Materials, EarlyView.
Gradient hydrogels are used to mimic the mechanical heterogeneity in native tissues, offering powerful in vitro platforms to study cell‐material interactions in diverse pathophysiological contexts. Here, we present a comprehensive review of the design and experimental considerations for stiffness gradient hydrogels, discussing exemplary achievements ...
Shin Wei Chong, Deepu Ashok, Anna Waterhouse, Marcela M. M. Bilek, Daniele Vigolo   +4 more
wiley   +1 more source

Effect of Process Temperature on Density and Electrical Characteristics of Hf_0.5Zr_0.5O₂ Thin Films Prepared by Plasma-Enhanced Atomic Layer Deposition. [PDF]

Nanomaterials (Basel), 2022
Kim HG, Hong DH, Yoo JH, Lee HC.
europepmc   +1 more source

3D‐Printed Piezoionic/Bioelectronic Hydrogel for Electro‐Metabolic Regulation of Osteogenic Differentiation

Advanced Healthcare Materials, EarlyView.
A 3D‐printed piezoionic GPMx hydrogel enables stable electromechanical signal generation under mechanical loading, exhibiting long‐term durability and low fatigue. As a bioactive patch, it restores endogenous bioelectricity to stimulate osteogenesis via Ca2+ influx and mitochondrial activation, while simultaneously enabling label‐free alkaline ...
Sayan Deb Dutta, Myoung Joon Jeon, Youjin Seol, Ki‐Taek Lim   +3 more
wiley   +1 more source

Latest advances in plasma techniques used for atomic layer deposition

, 2012
Webinar: Nanotechweb.org, Institute of Physics (IOP), November 2012 Atomic layer deposition (ALD) has established itself as the deposition technique of choice for ultra-thin, controlled, conformal, pin-hole free coatings.
Kessels, W.M.M.
core  

Controlling mechanical, structural, and optical properties of Al2O3 thin films deposited by plasma-enhanced atomic layer deposition with substrate biasing

, 2018
Complex interference multilayer systems typically implemented in high-performance optics consists of several layers of low and high refractive index materials.
Szeghalmi, A., Beladiya, V., Tünnermann, A., Kessels, W.M.M., Faraz, T.   +4 more
core   +1 more source