Results 211 to 220 of about 27,823 (260)
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The Behaviour of the Etching Rate in a Model of Plasma Etching
ZAMM - Journal of Applied Mathematics and Mechanics / Zeitschrift für Angewandte Mathematik und Mechanik, 1994AbstractDiese Arbeit ist sowohl der Modellierung einiger Oberflächen‐ und Volumenprozesse beim Plasmaätzen durch gewöhnliche Differentialgleichungen als auch der qualitativen Untersuchung des resultierenden Systems gewidmet. Die explizite Konstruktion von Attraktoreinhüllenden erlaubt, die Ätzrate des Prozesses durch eine Folge von Schranken ...
Kern, Marietta, Koksch, Norbert
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IEEE Circuits and Devices Magazine, 1990
An overview is given of plasma-etch processes used in microelectronics fabrication for pattern transfer, and the main requirements for plasma-assisted etching are outlined. The two primary etch mechanisms-chemical and physical-are examined. Issues involved in bringing plasma processes to the factory are discussed.
T.J. Cotler, M.E. Elta
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An overview is given of plasma-etch processes used in microelectronics fabrication for pattern transfer, and the main requirements for plasma-assisted etching are outlined. The two primary etch mechanisms-chemical and physical-are examined. Issues involved in bringing plasma processes to the factory are discussed.
T.J. Cotler, M.E. Elta
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Plasma Etching of Patterned Tungsten
Materials Science Forum, 1993Plasma etching of tungsten is discussed from the viewpoint of thin film structure and integrated circuit process engineering. The emphasis is on patterned tungsten etching for silicon device and X-ray mask fabrication. After introducing tungsten etch chemistries and mechanisms, microstructural aspects of tungsten films (crystal structure, grain size ...
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A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide
Materials, 2022Mariusz Sochacki +2 more
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PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
2021YATSUDA KOICHI +9 more
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Plasma etching behavior of Y2O3 ceramics: Comparative study with Al2O3
Applied Surface Science, 2016Ke Wang, Jing-Feng Li, Jin Luo
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Microscopic uniformity in plasma etching
Journal of Vacuum Science & Technology an Official Journal of the American Vacuum Society B, Microelectronics Processing and Phenomena, 1992Gottscho Richard A, Jürgensen C W
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