Results 221 to 230 of about 27,754 (260)

Plasma Etching

2011
openaire   +2 more sources

Plasma Etching

2012
Patrick M. Winter, Gregory M. Lanza, Samuel A. Wickline, Marc Madou, Chunlei Wang, Parag B. Deotare, Marko Loncar, Yoke Khin Yap, Jérôme Rose, Mélanie Auffan, Olivier Proux, Vincent Niviere, Jean-Yves Bottero, Zhong Lin Wang, Ying Liu, R. G. Polcawich, J. S. Pulskamp, R. M. Proie, Woo-Tae Park, Sergei V. Kalinin, Brian J. Rodriguez, Andrei L. Kholkin, Gang Logan Liu, Jao Lagemaat, Lorenzo Valdevit, John W. Hutchinson, Seajin Oh, Marc Madou, Katja Tonisch, Enrica De Rosa, Joseph Fernandez-Moure, Ennio Tasciotti, Denis Gebauer, Brian E. O’Neill, King C. Li   +34 more
openaire   +1 more source

Plasma Etching

2001
openaire   +2 more sources

Plasma etching

Microelectronics Reliability, 1980
openaire   +1 more source

Plasma etching

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
openaire   +1 more source

Microwave plasma etching

Vacuum, 1984
Keizo Suzuki, Ken Ninomiya, Shigeru Mishimatsu   +2 more
openaire   +1 more source

Introduction to Plasma Etching

1997
Plasma etching has become a crucial process step for the microelectronics industry, as computer logic and memory circuits require increasingly precise fabrication of fine-scale patterns in semiconductors, metals, and insulators. Plasma etching generally involves the dissociation and ionization of a neutral precursor gas to form reactive neutral ...
openaire   +1 more source

Physiochemical etching characteristics and surface analysis of Y2O3-MgO nanocomposite under different CF4/Ar/O2 plasma atmospheres

Applied Surface Science, 2023
Ho Jin, Young-Jo Park, Ha-Neul Kim
exaly  

Plasma Etch

2007
Peter Ventzek, Shahid Rauf, Terry Sparks
openaire   +1 more source

Plasma Etching

1983
J. A. MUCHA, D. W. HESS
openaire   +1 more source