Results 241 to 250 of about 1,458,991 (299)
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IEEE Circuits and Devices Magazine, 1990
An overview is given of plasma-etch processes used in microelectronics fabrication for pattern transfer, and the main requirements for plasma-assisted etching are outlined. The two primary etch mechanisms-chemical and physical-are examined. Issues involved in bringing plasma processes to the factory are discussed.
T.J. Cotler, M.E. Elta
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An overview is given of plasma-etch processes used in microelectronics fabrication for pattern transfer, and the main requirements for plasma-assisted etching are outlined. The two primary etch mechanisms-chemical and physical-are examined. Issues involved in bringing plasma processes to the factory are discussed.
T.J. Cotler, M.E. Elta
openaire +1 more source
Plasma Etching of Patterned Tungsten
Materials Science Forum, 1993Plasma etching of tungsten is discussed from the viewpoint of thin film structure and integrated circuit process engineering. The emphasis is on patterned tungsten etching for silicon device and X-ray mask fabrication. After introducing tungsten etch chemistries and mechanisms, microstructural aspects of tungsten films (crystal structure, grain size ...
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PLASMA ETCHING METHOD AND PLASMA ETCHING APPARATUS
2021YATSUDA KOICHI +9 more
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Plasma etching—A discussion of mechanisms Available to Purchase
Journal of Vacuum Science and Technology, 1979Harold F Winters, J W Coburn
exaly
Singular Sheet Etching of Graphene with Oxygen Plasma
Nano-Micro Letters, 2014Wen Li, Lixin Dong, Haider Al-Mumen
exaly
Plasma etching behavior of YO ceramics: Comparative study with AlO
Applied Surface Science, 2016Bo-Ping Zhang, Ke Wang, Jing-Feng Li
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