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Introduction to Plasma Etching

1997
Plasma etching has become a crucial process step for the microelectronics industry, as computer logic and memory circuits require increasingly precise fabrication of fine-scale patterns in semiconductors, metals, and insulators. Plasma etching generally involves the dissociation and ionization of a neutral precursor gas to form reactive neutral ...
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Plasma etching

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
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Plasma etching

Microelectronics Reliability, 1980
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Plasma Etching

1983
J. A. MUCHA, D. W. HESS
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Microwave plasma etching

Vacuum, 1984
Keizo Suzuki   +2 more
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