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Introduction to Plasma Etching
1997Plasma etching has become a crucial process step for the microelectronics industry, as computer logic and memory circuits require increasingly precise fabrication of fine-scale patterns in semiconductors, metals, and insulators. Plasma etching generally involves the dissociation and ionization of a neutral precursor gas to form reactive neutral ...
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Tuning the thickness of exfoliated quasi-two-dimensional β-Ga2O3 flakes by plasma etching
, 2017Yongbeom Kwon +5 more
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Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 1990
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Superhydrophobic Paper by Facile and Fast Atmospheric Pressure Plasma Etching
, 2017P. Dimitrakellis +3 more
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Role of neutral transport in aspect ratio dependent plasma etching of three-dimensional features
, 2017C. Huard +4 more
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