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Pulsed high-density plasmas for advanced dry etching processes Available to Purchase
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films, 2012Maxime Darnon +2 more
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PLASMA ETCHING DEVICE WITH PLASMA ETCH RESISTANT COATING
2017HUANG LIHUA LI +3 more
openaire +1 more source
Low‐temperature reactive ion etching and microwave plasma etching of silicon
Applied Physics Letters, 1988exaly
Low-Temperature Etching of Cu by Hydrogen-Based Plasmas
ACS Applied Materials & Interfaces, 2010Galit Levitin
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Charging effect simulation model used in simulations of plasma etching of silicon
Journal of Applied Physics, 2012Ivo W Rangelow, Valentyn Ishchuk
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