Results 121 to 130 of about 3,124 (304)

Measurement of Polishing Rate as a Function of Pad-Independent Abrasive Friction for Chemical Mechanical Polishing

, 2019
As features on integrated circuits continue to grow smaller, they become more susceptible to damage from sequential planarization steps during fabrication. As planarization (known as chemical mechanical planarization, or simply CMP) is preformed multiple
McGowan, Christopher
core  

7000 Years of Aboriginal Mining at Sugarloaf Hill in the Riverland Region of South Australia

Archaeology in Oceania, EarlyView.
ABSTRACT Silcrete and chert are commonly represented in Aboriginal archaeological lithic assemblages across large parts of the southwestern Murray‐Darling Basin (MDB). In South Australia (SA), these materials were sourced from a series of quarries located along the incised course of the Murray River through the upper Riverland region.
Craig Westell, Ian Moffat, Richard Fullagar, Amy Roberts, Justine Kemp, Mike Morley, Marc Fairhead, Simon Hoad, River Murray and Mallee Aboriginal Corporation   +8 more
wiley   +1 more source

Impact of Intermediate Wheatgrass an Adjunct Ingredient on the Chemical Composition and Development of Aroma Compounds in Sake Brewing

Cereal Chemistry, EarlyView.
ABSTRACT Background Replacing a portion of polished rice with intermediate wheatgrass (IWG) could diversify raw materials for sake, but its effects on composition and fermentation outcomes are not well characterized. The objective of this study was to quantify how adjunct form (whole vs.
Takehiro Murai, Curtis Payne, George Amponsah Annor   +2 more
wiley   +1 more source

Effect of CMP Pad and Slurry to STI and ILD Polishing

, 2010
STI (Shallow-Trench-Isolation) and ILD (Inter-layer-Dielectric polishing steps are important polish stages in FEOL (Front-End- of-Line) due to the early stage of transistor device formation. In recent years, ceria based slurries have been used in STI and
David Huang, S.V. Babu, Tim Moser, Liangyong Wang   +3 more
core   +1 more source

Keggin‐Type Aluminum Polyoxometalate‐Mediated Oxidation of Amorphous Carbon for Engineered Electrochemical Interfaces

Carbon Energy, EarlyView.
Keggin‐type Al‐POM‐coated silica achieves selective surface oxidation of amorphous carbon through electrostatic attraction and proton‐coupled oxidation, tailoring interfacial properties for lithium‐ion batteries and semiconductor processes. ABSTRACT Amorphous carbon is widely used in energy storage and semiconductor technologies, where surface ...
Ganggyu Lee, Dongmin Kang, Sumin Hong, Hongjun Park, Myungju Woo, Woojin Jeong, Giha Lee, Junsang Lee, Sangkyun Kim, Jea‐Gun Park, Takamasa Mori, Yehwan Kim, Taeseup Song, Ungyu Paik   +13 more
wiley   +1 more source

Polishing performance of magnetorheological elastomer pad for single-crystal silicon

Journal of Materials Research and Technology
Single-crystal silicon optical components are extensively utilized in sophisticated high-end equipment, such as X-ray space telescopes and high-energy laser systems.
Changsheng Li, Xiaohong Gao, Yusheng Zang, Zhaoxiang Chen, Jianjun Ding, Shuming Yang, Zhuangde Jiang   +6 more
doaj   +1 more source

Dual‐Field Synergistic Orientation of Carbon Fibers for High‐Efficiency Thermal Management

Carbon Energy, EarlyView.
The sample fabricated by synergistically combining reversed electric and low magnetic fields, with photocurable PEG/PPG gel serving as the matrix, exhibits excellent machinability and flexibility. Meanwhile, the thermal conductivity enhancement efficiency of this work is 1351%, significantly superior to similar carbon fiber composite materials ...
Zujian Zhao, Kang Xu, Yue Qin, Boren Yang, Kaiyuan Li, Linhong Li, Rongjie Yang, Yandong Wang, Hanxi Chen, Yiwei Zhou, Tao Cai, Cheng‐Te Lin, Kazuhito Nishimura, Maohua Li, Nan Jiang, Jinhong Yu   +15 more
wiley   +1 more source

Chemical-mechanical wear mechanism in polyurethane polishing pad materials

, 2000
In the highly competitive and lucrative industry of semiconductors, the effectiveness of the Chemical Mechanical Polishing (CMP) process is crucial for developing smaller device technologies. In this study, the structure of the two-layered stacked IClOOO/
Li, Irene
core  

Synthesis and characterization of a highly hydrophilic nanocomposite for wettability alteration, water/oil interfacial tension reduction, and enhanced oil recovery

The Canadian Journal of Chemical Engineering, EarlyView.
Mechanism of wettability alteration, interfacial tension reduction, and oil recovery by novel nanocomposite. Abstract The development of stable nanofluids (NFs) for enhanced oil recovery (EOR) relies on optimizing interactions between reservoir rocks and fluids.
Ehsan Jafarbeigi, Ehsan Kamari, Amir H. Mohammadi   +2 more
wiley   +1 more source

Investigation of a Polishing Pad and a Carrier Film for Decreasing Edge Roll Off of Workpiece

, 2011
Demand for diminishing edge roll off of workpiece has rapidly increased, especially in polishing silicon wafers and glass disks. However, the conventional polishing technologies cannot meet the demand.
Wen Xiao Wang, Urara Satake, Toshiyuki Enomoto, Norikazu Tabata   +3 more
core   +1 more source