Results 101 to 110 of about 3,124 (304)

Diamond Conditioner Microwear Effect on Pad Surface Height Distribution in Tungsten Chemical Mechanical Polishing

, 2011
In this study, the surface topographies of chemical mechanical polishing (CMP) pad samples for varying levels of diamond microwear of a conditioner have been measured using a confocal microscope and an X-ray computer tomography (CT) scanner.
Masanori Kawakubo, Kazunori Kadomura, Yohei Yamada   +2 more
core   +1 more source

Stem Cell Differentiation Disperses Transcriptional Clusters via a Conserved Surface‐Condensate Trajectory

Advanced Science, EarlyView.
Stem cell differentiation follows a conserved surface condensate trajectory: H3K27ac super enhancers nucleate large RNA polymerase II clusters that grow and unfold before transcriptional activity disperses them. This work reveals how biophysical forces at enhancer surfaces dynamically build and dismantle stem cell transcription hubs, reshaping cell ...
Tim Klingberg, Irina Wachter, Agnieszka Pancholi, Matthias Akyel, Yomna Gohar, Priya Kumar, Ana Miguel Fernandes, Yuzhi Bao, Alica Schmidt‐Heydt, Marcel Piepers, Alicia Günthel, Marcel Sobucki, Elisa Kämmer, Süheyla Eroğlu‐Kayıkçı, Stephan Allgeier, Sylvia Erhardt, Vasily Zaburdaev, Carmelo Ferrai, Lennart Hilbert   +18 more
wiley   +1 more source

Method for monitoring polishing pad used in chemical-mechanical planarization process

, 2011
[[abstract]]A method for monitoring a condition of a polishing pad used in a chemical-mechanical planarization (CMP) process to polish a semiconductor wafer is disclosed.
Ho, Cheng-Hong;Liu, Kuo-Hsing
core  

Modeling and mitigation of pad scratching in chemical-mechanical polishing

, 2013
In the chemical-mechanical polishing (CMP) of semiconductor structures, such defects as micro- and nano-scale scratches are frequently produced on the surfaces being polished.
Chun, J. -H., Shin, S. -H., Kim, Sanha, Saka, N.   +3 more
core   +1 more source

An Integrative Strategy Delineates Modular Metabolic Remodeling and Potential Therapeutic Targets Across Metabolic Diseases

Advanced Science, EarlyView.
An integrative single‐cell atlas across multiple metabolic diseases reveals coordinated metabolic modules and disease‐shared versus disease‐specific pathway activities. By systematically comparing scoring strategies, a robust RankAve framework is established. Coupled with network analysis and drug‐target prediction, this resource uncovers cross‐disease
Kuan Yang, Congxue Hu, Hang Zhao, Xiao Peng, Yiming Yan, Jiasi Wang, Wenqi Jiang, Depeng Mu, Yan Cao, Xia Li, Yunpeng Zhang   +10 more
wiley   +1 more source

Gel‐Amin for Improving Extracellular Recordings of Cardiomyocytes in a 3D Microphysiological System

Advanced Electronic Materials, EarlyView.
This work combines a conductive collagen‐based hydrogel with a laser‐cut and assembly technique to fabricate microphysiological systems that improve extracellular recordings of cardiomyocytes in 3D on microelectrode arrays. The inclusion of choline acrylate into GelMA imparts a higher electrical conductivity and improves the signal‐to‐noise ratio of on‐
Dominic Pizzarella, Katelyn Neuman, Nolan Burson, Abigail N. Koppes, Ryan A. Koppes   +4 more
wiley   +1 more source

Diamond Disc Pad Conditioning in Chemical Mechanical Polishing: A Literature Review of Process Modeling

, 2009
Chemical Mechanical Polishing (CMP) is a major manufacturing step extensively used to planarize semiconductor wafers. In CMP, the polishing pad surface is glazed by residues.
Emmanuel A. Baisie, X. H. Zhang, Z. C. Li   +2 more
core   +1 more source

Retinal Vessel Segmentation: A Comprehensive Review From Classical Methods to Deep Learning Advances (1982–2025)

Advanced Intelligent Systems, EarlyView.
Four decades of retinal vessel segmentation research (1982–2025) are synthesized, spanning classical image processing, machine learning, and deep learning paradigms. A meta‐analysis of 428 studies establishes a unified taxonomy and highlights performance trends, generalization capabilities, and clinical relevance.
Avinash Bansal, Jan Kubíček, Jana Bahrová, Alice Varyšová, Martin Augustýnek, Marek Penhaker, Juraj Timkovič   +6 more
wiley   +1 more source

Development of Orderly Micro Asperity on Polishing Pad Surface for Chemical Mechanical Polishing (CMP) Process using Anisotropic Etching

, 2013
CMP is one of the most essential processes in ULSI manufacture. However, the polishing characteristics during CMP remain unidentified because pad surface roughness such as asperity or texture is complicated and random.
Baba, A.; Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology, Fukuoka, Khajornrungruang, P.; Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology, Fukuoka, Kimura, K.; Faculty of Computer Science and Systems Engineering, Kyushu Institute of Technology, Fukuoka, Yasuda, K.; Department of Mechanical Information Science and Technology, Kyushu Institute of Technology, Fukuoka, Tanaka, A.; Department of Mechanical Information Science and Technology, Kyushu Institute of Technology, Fukuoka   +4 more
core  

An analytical investigation of pad wear caused by the conditioner in fixed abrasive chemical–mechanical polishing

, 2014
Fixed abrasive chemical–mechanical polishing (CMP) is an efficient surface finishing method. The non-uniformity of substrates after polishing is one of the most interesting things in current trends in research.
Zhong, Zhao Wei, Tian, Yebing, Nguyen, N. Y.   +2 more
core   +1 more source