Effect of Structurally Modified Toluene Diisocyanate-Based Polyurethane Pads on Chemical Mechanical Polishing of 4H Silicon Carbide Substrate. [PDF]
Meng Y, Zhang S, Zhang Z.
europepmc +1 more source
Evaluation on perishing of polishing characteristics for polishing pad
openaire +1 more source
Study of Polishing Pad for Silicon Wafer
yamamoto, keiji +4 more
openaire +1 more source
Deep blueprint: A literature review and guide to automated image classification for ecologists
A practical, literature‐grounded review that gives ecologists a clear, modular workflow for deep learning image classification. With code, GUIs and a novel deep sea case study (automated deep sea biotope classification) it lowers technical barriers and provides a usable blueprint for accelerating, standardising, and scaling ecological image analysis ...
Chloe A. Game +2 more
wiley +1 more source
Peripheral artery disease in diabetes. [PDF]
Amin S, Fukaya E, Athavale A.
europepmc +1 more source
Cuttings, Combings, Fettlings and Flock: Gender and Australian Wool ‘Waste’, 1900–1950
ABSTRACT As Australia's wool industry produced vast amounts of fine fleece from the nineteenth century, the wool processing and clothes manufacturing industries generated waste – products like cuttings, combings, fettlings and flock. Salvaged and then sold to waste merchants, these and other materials had a second life.
Lorinda Cramer
wiley +1 more source
Research on the Trajectory and Relative Speed of a Single-Sided Chemical Mechanical Polishing Machine. [PDF]
Ye G, Yao Z.
europepmc +1 more source
Control of the polishing perfomance with polishing pad surface roughness
openaire +1 more source
‘A Sort of Armed Argument’: Ireland's Civil War of Words
Abstract This article sets out to contribute to the study of the languages of European civil wars through outlining and analysing the deployment of language as a weapon by the opposing sides of the Irish independence movement that split over the terms of the Anglo‐Irish Treaty of December 1921.
DONAL Ó DRISCEOIL
wiley +1 more source
Multi-Field Characterisation of Material Removal Processes in Ultrasonic Magnetorheological Chemical Compound Polishing of GaN Wafers. [PDF]
Liang H +7 more
europepmc +1 more source

