Results 201 to 210 of about 2,424 (264)

Chemical Mechanical Polishing of Zerodur<sup>®</sup> Using Silica and Ceria Nanoparticles: Toward Ultra-Smooth Optical Surfaces. [PDF]

open access: yesNanomaterials (Basel)
Bellahsene H   +10 more
europepmc   +1 more source

Beyond the Sober State: The Work of Drunkenness in British Bureaucracy

open access: yesSociology Lens, EarlyView.
ABSTRACT This article reports the drinking stories of British civil service clerical workers based at a large civil service office complex located in Newcastle upon Tyne between 1968 and 1993. It uses these stories to develop an account of state formation that takes seriously the place of joy, solidarity, contention, and exhaustion within public sector
Michael Vine
wiley   +1 more source

A Novel Method of Adding Sucrose in Fixed Abrasive Pads for Self-Conditioning. [PDF]

open access: yesACS Omega
Ma F   +6 more
europepmc   +1 more source

Flow-Induced Dynamic Dispersion in Dispersant-Free Mixed-Oxide Slurry Systems. [PDF]

open access: yesLangmuir
Lin YA   +6 more
europepmc   +1 more source

GRIN pad polishing

PhotonicsViews, 2022
AbstractA new concept for CNC polishing pads is given by the gradient index (GRIN) pad polishing tools. Instead of gluing polishing foils as a layer onto metallic tool holders that have the spherical surface to be polished, 3D‐printed GRIN pads are applied directly to the CNC tool axis.
Oliver Fähnle   +9 more
openaire   +2 more sources

Variation of polish pad shape during pad dressing

Materials Science and Engineering: B, 1999
Abstract In silicon wafer polishing and CMP processes, polish pad dressing (conditioning) is often used to restore pad performance. In this report, variation of polish pad shape during dressing is studied by using diamond-plated cup wheels and sandpaper rings, respectively. Result shows that pad shape becomes concave after certain amount of dressing.
Yi-yang Zhou, Eugene C Davis
openaire   +1 more source

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