Results 221 to 230 of about 2,582 (264)
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S1330203 Polishing characteristics of porous polishing pads
The Proceedings of Mechanical Engineering Congress, Japan, 2014Yasuhiro TANI +3 more
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Advanced polishing pads and related polishing pad manufacturing methods
2023JAWALI PUNEET NARENDRA +6 more
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Effects of particle size, polishing pad and contact pressure in free abrasive polishing
Wear, 1996exaly
Viscoelastic behavior of polishing pad: Effects on edge roll-off during silicon wafer polishing
Precision Engineering, 2020Toshiyuki Enomoto
exaly
Characteristics of chemical mechanical polishing using graphite impregnated pad
International Journal of Machine Tools and Manufacture, 2010Ming-Yi Tsai
exaly
Novel diamond conditioner dressing characteristics of CMP polishing pad
International Journal of Machine Tools and Manufacture, 2009Shun-Tong Chen +2 more
exaly
Fabrication of a polishing pad for chemical mechanical polishing
2023LEE AN-HSUAN +5 more
openaire +2 more sources

