Results 221 to 230 of about 2,424 (264)

S1330203 Polishing characteristics of porous polishing pads

The Proceedings of Mechanical Engineering Congress, Japan, 2014
Yasuhiro TANI, Yu ZHANG, Junji MURATA, Nobuyuki NOMURA   +3 more
openaire   +1 more source

Polishing Pad

Metal Finishing, 1998
openaire   +1 more source

Modification method of polyurethane, polyurethane, polishing pad, and modification method of polishing pad

2021
OSHITA AZUSA, KATO MITSURU, TAKEGOSHI MINORI, OKAMOTO CHIHIRO, KATO SHINYA   +4 more
openaire   +3 more sources

Advanced polishing pads and related polishing pad manufacturing methods

2023
JAWALI PUNEET NARENDRA, BARADANAHALLI KENCHAPPA NANDAN, FUNG JASON G, WEWALA GONNAGAHADENIYAGE SHIYAN AKALANKA JAYANATH, BAJAJ RAJEEV, MANZONIE ADAM WADE, LAWING ANDREW SCOTT   +6 more
openaire   +1 more source

Effects of particle size, polishing pad and contact pressure in free abrasive polishing

Wear, 1996

exaly  

Polishing Pads

2011
openaire   +1 more source

Dependence of pad performance on its texture in polishing mono-crystalline silicon wafers

International Journal of Mechanical Sciences, 2010
Y M Ali
exaly  

Polishing Characteristics of Hydrophilic Pad in Chemical Mechanical Polishing Process

Materials and Manufacturing Processes, 2012
Ming-Yi Tsai
exaly  

Evaluation of the wafer polishing pad capacity and lifetime in the machining of reliable elevations

International Journal of Machine Tools and Manufacture, 2013
Seong-Hyun Kim, Eun-Sang Lee
exaly  

Characteristics of chemical mechanical polishing using graphite impregnated pad

International Journal of Machine Tools and Manufacture, 2010
Ming-Yi Tsai
exaly