Results 241 to 250 of about 2,582 (264)

Polishing pad surface characterisation in chemical mechanical planarisation

Journal of Materials Processing Technology, 2004
exaly  

A study on polishing of molds using hydrophilic fixed abrasive pad

International Journal of Machine Tools and Manufacture, 2004
Jae Young Choi, Hae do Jeong
exaly  

Role of polycation adsorption in poly-Si, SiO and SiN removal during chemical mechanical polishing: Effect of polishing pad surface chemistry

Colloids and Surfaces A: Physicochemical and Engineering Aspects, 2011
Sitaraman Krishnan, S V Babu
exaly  

New optical polishing pad

Journal of the Franklin Institute, 1963
openaire   +1 more source

Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions

Microelectronic Engineering, 2006
Nam-Hoon Kim, Yong-Jin Seo, Woo-Sun Lee
exaly  

Methods for polishing semiconductor substrates that adjust for pad-to-pad variance

2020
YOSHIMURA ICHIRO, CHU ALEX, CHIU H J, BHAGAVAT SUMEET, TAEHYEONG KIM, KATAKURA NORIMASA, KITAZAWA MASARU   +6 more
openaire   +2 more sources

Modelling of polyurethane polishing pad surface topography and fixed-point polished surface profile

Tribology International
Tianbiao Yu, Ji Zhao, Yingdong Liang
exaly  

METHOD FOR MODIFYING POLYURETHANE, POLYURETHANE, POLISHING PAD, AND METHOD FOR MODIFYING POLISHING PAD

2019
OSHITA AZUSA, KATO MITSURU, TAKEGOSHI MINORI, OKAMOTO CHIHIRO, KATO SHINYA   +4 more
openaire   +2 more sources

Monitoring of polishing pad texture in chemical mechanical polishing

2023
OSTERHELD THOMAS H, CHERIAN BENJAMIN
openaire   +1 more source

Estimating chemical mechanical polishing pad wear with compressibility

International Journal of Advanced Manufacturing Technology, 2006
exaly