Results 241 to 250 of about 2,424 (264)

Effect of pad wear on tool influence function in robotic polishing of large optics

International Journal of Advanced Manufacturing Technology, 2019
Songlin Wan, Xiangchao Zhang
exaly  

Modelling of polyurethane polishing pad surface topography and fixed-point polished surface profile

Tribology International
Tianbiao Yu, Ji Zhao, Zhijie Cui
exaly  

Pad conditioning in chemical mechanical polishing: a conditioning density distribution model to predict pad surface shape

International Journal of Manufacturing Research, 2013
Emmanuel A Baisie
exaly  

Polishing pad for electrochemical mechanical polishing

2005
COOK LEE MELBOURNE, JAMES DAVID B, ROBERTS JOHN V H   +2 more
openaire   +1 more source

Methods for polishing semiconductor substrates that adjust for pad-to-pad variance

2020
YOSHIMURA ICHIRO, CHU ALEX, CHIU H J, BHAGAVAT SUMEET, TAEHYEONG KIM, KATAKURA NORIMASA, KITAZAWA MASARU   +6 more
openaire   +2 more sources

New optical polishing pad

Journal of the Franklin Institute, 1963
openaire   +1 more source

Investigation of the pad-conditioning performance deterioration in the chemical mechanical polishing process

Wear, 2017
Taesung Kim, Cheolmin Shin, Seokjun Hong   +2 more
exaly  

Effects of conditioning temperature on polishing pad for oxide chemical mechanical polishing process

Microelectronic Engineering, 2005
Nam-Hoon Kim, Yong-Jin Seo, Woo-Sun Lee   +2 more
exaly  

Formulations for advanced polishing pads

2023
GANAPATHIAPPAN SIVAPACKIA, VORA ANKIT, FU BOYI, HARIHARAN VENKAT, YAMAMURA MAYU, CORNEJO MARIO, ABRAMSON IGOR, YANG MO, REDFIELD DANIEL, BAJAJ RAJEEV, PATIBANDLA NAG B   +10 more
openaire   +1 more source

METHOD FOR MODIFYING POLYURETHANE, POLYURETHANE, POLISHING PAD, AND METHOD FOR MODIFYING POLISHING PAD

2019
OSHITA AZUSA, KATO MITSURU, TAKEGOSHI MINORI, OKAMOTO CHIHIRO, KATO SHINYA   +4 more
openaire   +2 more sources