Results 231 to 240 of about 2,424 (264)

Viscoelastic behavior of polishing pad: Effects on edge roll-off during silicon wafer polishing

Precision Engineering, 2020
Urara Satake
exaly  

Novel diamond conditioner dressing characteristics of CMP polishing pad

International Journal of Machine Tools and Manufacture, 2009
Shun-Tong Chen, Ming-Yi Tsai, Yunn‐Shiuan Liao   +2 more
exaly  

A study on polishing of molds using hydrophilic fixed abrasive pad

International Journal of Machine Tools and Manufacture, 2004
Haedo Jeong
exaly  

Modeling and analysis of the material removal profile for free abrasive polishing with sub-aperture pad

Journal of Materials Processing Technology, 2014
Geok Soon Hong, Ji Zhao, Yoke San Wong
exaly  

Self-conditioning of encapsulated abrasive pad in chemical mechanical polishing

Journal of Materials Processing Technology, 2003
Haedo Jeong
exaly  

Fabrication of a polishing pad for chemical mechanical polishing

2023
LEE AN-HSUAN, SHE MING-SHIUAN, WU CHEN-HAO, LIAO CHUN-HUNG, LEE SHEN-NAN, TSAI TENG-CHUN   +5 more
openaire   +2 more sources

Temperature effects of pad conditioning process on oxide CMP: Polishing pad, slurry characteristics, and surface reactions

Microelectronic Engineering, 2006
Nam-Hoon Kim, Yong-Jin Seo, Woo-Sun Lee   +2 more
exaly  

Polishing system, polishing pad, and related methods

2023
BARKAM SWETHA, LOW KHIAM-HOW, CULTRA JAMES A   +2 more
openaire   +1 more source

A polishing process for nonlinear optical crystal flats based on an annular polyurethane pad

Applied Surface Science, 2012
Defeng Liao
exaly  

Polishing pad surface characterisation in chemical mechanical planarisation

Journal of Materials Processing Technology, 2004
exaly