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Polishing pad and method for polishing a semiconductor wafer
2013SCHWANDNER JUERGEN, KOPPERT ROLAND
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Polishing pad cluster for polishing a semiconductor wafer
1996TALIEH HOMAYOUN, WELDON DAVID E
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Self-conditioning of encapsulated abrasive pad in chemical mechanical polishing
Journal of Materials Processing Technology, 2003exaly
Factors influencing the dressing rate of chemical mechanical polishing pad conditioning
International Journal of Advanced Manufacturing Technology, 2006exaly
METHOD FOR MANUFACTURING A POLISHING SHEET AND A POLISHING PAD
AN JOONHO +4 moreopenaire +1 more source
Polishing pad support that improves polishing performance and longevity
2004OBENG YAW S, THOMAS PETER A
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Conductive polishing pad and method for making the same
2010FENG CHUNG-CHIH +3 more
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