Fabrication of a fractal pattern device for focus characterizations of X-ray imaging systems by Si deep reactive ion etching and bottom-up Au electroplating. [PDF]
Appl Opt, 2022 Shi Z +6 more
europepmc +1 more source
“Smelltronics”—From Gas to Smell Sensing
Advanced Materials, EarlyView.The emerging field of smelltronics, encompassing sensing technologies for complex volatile organic compounds, holds significant potential for extracting valuable chemical information. It facilitates the noninvasive, real‐time monitoring of humans, food, and the environment.
Takeshi Ono +7 more
wiley +1 more source
Low-loss silicon nitride Kerr-microresonators fabricated with metallic etch masks via metal lift-off
Scientific ReportsStoichiometric silicon nitride has emerged as a widely used integrated photonic material owing to its high index of refraction, nonlinear optical properties, and broad transparency window spanning visible to mid-IR frequencies.
Gabriel M. Colación +3 more
doaj +1 more source
New Colloidal Lithographic Nanopatterns Fabricated by Combining Pre-Heating and Reactive Ion Etching
Nanoscale Research Letters, 2009 We report a low-cost and simple method for fabrication of nonspherical colloidal lithographic nanopatterns with a long-range order by preheating and oxygen reactive ion etching of monolayer and double-layer polystyrene spheres.
Cong Chunxiao +3 more
doaj +1 more source
Versatilely tuned vertical silicon nanowire arrays by cryogenic reactive ion etching as a lithium-ion battery anode. [PDF]
Sci Rep, 2021 Refino AD +11 more
europepmc +1 more source
Phase‐Pure and Size‐Tunable Tin Halide Perovskite Quantum Dots
Advanced Materials, EarlyView.A trioctylphosphine oxide modulated protocol allows for the synthesis and study of the optical properties of a broad library of tin halide perovskite quantum dots across multiple A‐ and X‐site compositions with precise size tuning while eliminating unwanted 2D phases.
Ole F. Dressler +7 more
wiley +1 more source
Reactive ion etching (RIE) of polyimidesiloxanes
, 1991 Reactive ion etching of polyimidesiloxanes is playing an important role as a key process in multi-layer interconnection circuits. The main reasons for this are its finer resolution, controllability and anisotropic etching nature.
Tang, D. Y. +4 more
core
Advanced Materials, EarlyView.A giant insulator to metal transition and emergent superparamagnetism are revealed by nanoparticle exsolution in non‐stoichiometric titanate perovskite thin films. By combining transport, synchrotron spectroscopy, and first‐principles calculations, this work reveals how defect reconfiguration and lattice reconstruction fundamentally reshape electronic ...
Sungil Kim +11 more
wiley +1 more source
Investigation on the origin of wurtzite domains in thick cubic GaN using reactive ion etching
, 2000 We measured the depth profiling of photoluminescence (PL) in cubic GaN films. The depth-resolved PL of normal grown GaN layers showed that the near-band-edge luminescence intensities of both cubic and wurtzite domains remained constant only until an ...
Yang H +8 more
core
Phase Engineering of Nanomaterials (PEN): Evolution, Current Challenges, and Future Opportunities
Advanced Materials, EarlyView.This review summarizes the synthesis, phase transition, advanced characterization spanning ex situ to in situ and operando techniques, and diverse applications of phase engineering of nanomaterials (PEN). It further outlines key challenges and future opportunities, such as phase stability, architecture control, and artificial intelligence (AI)‐driven ...
Ye Chen +7 more
wiley +1 more source