Results 121 to 130 of about 16,783 (158)

Reactive ion etching for submicron structures

Journal of Vacuum Science and Technology, 1981
The etch resistance of PMMA was measured under various reactive ion etching conditions and compared with that of silicon dioxide, silicon and Shipley AZ 1350 resist. The resulting profiles transferred into the substrates masked with PMMA were also studied under various reactive ion etching conditions.
J. D. Chinn, I. Adesida, E. D. Wolf, R. C. Tiberio   +3 more
openaire   +1 more source

Lithography and Reactive Ion Etching in Microfabrication

1995
The term “microfabrication” has been used to denote the technology for manufacturing integrated micro-circuits and microsystems. During the last 30 years the advanced micro-electronics could not maintain its place without microfabrication technology and this is also the case for the present and for the future.
I. W. Rangelow, P. Hudek
openaire   +1 more source

Deep Reactive Ion Etching

2010
Laermer, Franz, Franssila, Sami, Sainiemi, Lauri, Kolari, Kai   +3 more
openaire   +6 more sources

Sidewall Tapering in Reactive Ion Etching

Journal of The Electrochemical Society, 1985
On signale un phenomene de retrecissement suivant les parois laterales en gravure ionique reactive, avec une pente ∼75°. Une facette du masque de photoresist se forme a cause de la variation angulaire de la vitesse de perte de resist. L'angle de la facette avec le plan vertical est d'environ 16° et sa vitesse de propagation plus de deux fois la vitesse
openaire   +1 more source

Reactive Ion Etching of Tantalum in Silicon Tetrachloride

SSRN Electronic Journal, 2022
Asaad K. Edaan Al-mashaal, Rebecca Cheung   +1 more
openaire   +1 more source

Influence of resists on reactive ion etching

Czechoslovak Journal of Physics, 1993
In the course of plasma etching we can observe a loading effect, i.e. the etch rate depends on the size of the etched surface exposed to the plasma. This phenomenon was explained according to Mogab by the plasma active etch species depletion via a rapid etch reaction.
openaire   +1 more source

Reactive Ion Etching

1984
BERNARD GOROWITZ, RICHARD J. SAIA
openaire   +1 more source

Smooth and high-rate reactive ion etching of diamond

Diamond and Related Materials, 2002
Yoshiki Nishibayashi, Koji Kobashi
exaly  

Deep reactive ion etching as a tool for nanostructure fabrication

Journal of Vacuum Science & Technology B, 2009
A Colli, Jikui Luo, Andrew J Flewitt
exaly  

Sheath collision processes controlling the energy and directionality of surface bombardment in O2reactive ion etching

Journal of Applied Physics, 1988
C W Jürgensen, Jürgensen C W
exaly