Results 151 to 160 of about 1,889,328 (287)

Tamper‐Responsive Physical Unclonable Functions via Graphene‐Interlayered Block Copolymer Random Structures

Advanced Materials, EarlyView.
Self‐invalidating multilayer physical unclonable functions (PUFs) integrate fingerprint‐like metal nanopattern bilayers from block copolymer templates with highly reactive reduced graphene oxide (rGO) interlayers. This tamper‐responsive architecture blocks all unauthorized physical and chemical replication attempts while autonomously deactivating ...
Gyu Hui Jo, Dae Hui Park, Jeong‐Ho Jang, Woo Seok Tack, Jin Man Kim, Hak Ki Yu, Hyeong Min Jin, Jang Hwan Kim   +7 more
wiley   +1 more source

Improving Adhesion of UHMWPE with Epoxy Matrix by Reactive Ion Etching of UHMWPE Using Ar-O₂ Plasma and the Effects of Plasma on Adhesion at the Micro- and Macroscale. [PDF]

ACS Appl Mater Interfaces
Sikander U, Hazzard MK, Hamerton I, Wisnom MR.   +3 more
europepmc   +1 more source

Plasmon‐Enhanced Second‐Harmonic Generation in Atomically Thin Crystalline Silver Nanostructures

Advanced Materials, EarlyView.
Atomically thin crystalline silver films combine vertical quantum confinement with lateral plasmonic field enhancement to boost second‐harmonic generation. Nanoribbon and nanotriangle arrays enable geometry‐tunable infrared plasmon resonances, producing strong SHG from deeply subwavelength metallic volumes compatible with silicon‐based nanophotonics ...
Saad Abdullah, Philipp K. Jenke, Andrew P. Weber, Álvaro Rodríguez Echarri, Vahagn Mkhitaryan, Fadil Iyikanat, Frederik Schiller, Philip Walther, J. Enrique Ortega, Lee A. Rozema, F. Javier García de Abajo   +10 more
wiley   +1 more source

Dry Etching Characteristics of InGaZnO Thin Films Under Inductively Coupled Plasma-Reactive-Ion Etching with Hydrochloride and Argon Gas Mixture. [PDF]

Materials (Basel)
Oh C, Ju MW, Jeong H, Song JH, Kim BS, Lee DG, Cho C.   +6 more
europepmc   +1 more source

Reactive ion etching for fabrication of biofunctional titanium nanostructures. [PDF]

Sci Rep, 2019
Ganjian M, Modaresifar K, Zhang H, Hagedoorn PL, Fratila-Apachitei LE, Zadpoor AA.   +5 more
europepmc   +1 more source

Reactivity‐Guided Janus Graphene With Asymmetric Interfacial Electrostatics for Tunable Charge Transport

Advanced Materials, EarlyView.
Stepwise dual‐side functionalization creates covalent Janus graphene with chemically and electrostatically asymmetric interfaces. The resulting nonadditive surface‐potential response and pronounced charge‐transport modulation demonstrate a versatile route for tailoring the electronic properties of graphene.
Shishi Liu, Zhuting Hao, Mira Kreßler, Oguzhan Yücel, Lotte Polling, Adrián Dewambrechies, Wesley Pietsch, Philip Nickl, Felix Fels, Kevin Pagel, Markus R. Heinrich, Patryk Kusch, Kirill Bolotin, Xin Chen, Siegfried Eigler   +14 more
wiley   +1 more source

Silicon nanowires by self-organised reactive ion etching

, 2012
Boden, S.A., Bagnall, D.M., Banakar, Mehdi, Sari, Ibrahim, Aghdaei, Sara   +4 more
core   +1 more source

On reactive Ion Etching of Parylene-C with Simple Photoresist Mask for Fabrication of High Porosity Membranes to Capture Circulating and Exfoliated Tumor Cells. [PDF]

Micromachines (Basel)
Rabadi I, Carpentieri D, Wang J, Zenhausern F, Gu J.   +4 more
europepmc   +1 more source

Low Resistance Interphase Formation at the PEO‐LiTFSI|LGPS Interface in Lithium Solid‐State Batteries

Advanced Materials Interfaces, EarlyView.
Interfacial charge transfer and low‐resistance interphase formation between PEO‐based polymer and Li10GeP2S12 solid electrolytes are investigated using multi‐electrode impedance spectroscopy and advanced analytical techniques such as XPS and ToF‐SIMS.
Ujjawal Sigar, Timo Weintraut, Sebastian L. Benz, Semih Engün, Sascha Kremer, Anja Henss, Felix H. Richter   +6 more
wiley   +1 more source

Recent Advances in Plasma‐Enhanced Atomic Layer Etching for Next‐Generation Nanofabrication

Advanced Materials Interfaces, EarlyView.
Continued semiconductor miniaturization demands atomic‐scale patterning and ultralow surface roughness beyond the capabilities of conventional reactive ion etching. This review highlights advances in isotropic and anisotropic plasma‐enhanced atomic layer etching since 2020, covering fundamental mechanisms, applications across major semiconductor ...
Shih‐Nan Hsiao
wiley   +1 more source