Results 81 to 90 of about 1,889,328 (287)

Low-Damage Reactive Ion Etching of Nanoplasmonic Waveguides with Ultrathin Noble Metal Films

open access: yesApplied Sciences, 2019
Nanoplasmonic waveguides utilizing surface plasmon polaritons (SPPs) propagation have been investigated for more than 15 years and are now well understood.
Alina A. Dobronosova   +14 more
doaj   +1 more source

Silver Patterning by Reactive Ion Beam Etching for Microelectronics Application

open access: yes, 2004
Dry etching of silver for the metallization in microelectronics is investigated. Etching is performed using an electron-cyclotron-resonance reactive-ion-beam-etching system (ECR-RIBE) in an Ar/CF4 or Ar/CF4/O2 mixture.
D. Schmitt-Landsiedel   +5 more
core   +1 more source

Structure‐Property Relationships in Catecholamine Coatings for Broad Surface Functionalization

open access: yesAdvanced Functional Materials, EarlyView.
Inspired by mussel adhesive proteins (MAPs), six catecholamine molecules with different molecular structure were systematically characterized and compared based on their ability to form homogeneous, reactive coatings. Highlighting candidates capable of balancing coating properties of interest, their successful use as primer layers for organic and ...
Caroline F. Harms   +5 more
wiley   +1 more source

17.6% Conversion Efficiency Multicrystalline Silicon Solar Cells Using the Reactive Ion Etching with the Damage Removal Etching

open access: yesInternational Journal of Photoenergy, 2012
For lower reflectance, we applied a maskless plasma texturing technique using reactive ion etching (RIE) on acidic-textured multicrystalline silicon (mc-Si) wafer. RIE texturing had a deep and narrow textured surface and showed excellent low reflectance.
Ji-Myung Shim   +12 more
doaj   +1 more source

Optical Properties of Heavily Mg-Doped p-GaN Films Prepared by Reactive Ion Etching

open access: yes, 2013
[[abstract]]The effect of the damage caused by reactive ion etching on the optical properties of heavily Mg-doped p-type GaN (p-GaN) was investigated in this study.
Lin, Yow-Jon; Chu, Yow-Lin; Liu, Day-Shan; Lee, Chi-Sen; Chien, Feng-Tso
core  

Mechanism of Dry Etching of Silicon Dioxide: a Case of Direct Reactive Ion Etching

open access: yes, 1984
Reactive sputter etching of SiO2 with CHF3-O2 plasmas has been investigated in a parallel plate reactor by combining etch rate measurements with concurrent determination of ion densities (using a Langmuir probe) and the composition of neutral plasma ...
Ch. Steinbruchel   +2 more
core   +1 more source

Polymer Side‐Chain Electronic Effects Regulating Solvation Sheath for Low‐Temperature and High‐Voltage Lithium Metal Batteries

open access: yesAdvanced Functional Materials, EarlyView.
This work reveals the influence of polymer side‐chain electronic effects on the Li+ solvation sheath in gel polymer electrolytes. Electron‐donating side chains induce the strong Li+ coordination and FDMA‐dominated solvation, impeding Li+ desolvation, whereas electron‐withdrawing side chains weaken Li+ coordination, facilitating anion‐rich solvation and
Xianbin Wu   +7 more
wiley   +1 more source

A practical approach to reactive ion etching

open access: yes, 2015
In this paper, general aspects of the reactive ion etching (RIE) technique will be described, such as anisotropy, loading effect, lag effect, RIE chemistries and micro-masking, followed by a brief overview of etching dielectrics (SiOx, SiNx) and ...
Karouta, Fouad
core   +1 more source

Unique Role of Microstructure of a Bioimplant Zinc Alloy and Protein Content of Simulated Body Fluid in Corrosion and Fracture

open access: yesAdvanced Functional Materials, EarlyView.
BSA addition to physiological solutions enhances resistance of a Zn alloy to stress corrosion cracking (SCC) but reduces its corrosion resistance. Extended surface characterization explains the contrasting influences on corrosion and SCC. Unexpectedly, the alloy suffers transgranular SCC (TGSCC), despite extensive grain boundary precipitation. Thorough
RK Singh Raman   +9 more
wiley   +1 more source

Submicron patterns formed by reactive ion etching

open access: yes, 2022
S.467-473A tri-level etching process based on polyimide as bottom layer, silicon nitride as intermediate layer, and PMMA resist as top layer is presented.
Pilz, W.   +3 more
core   +1 more source

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