Atomic Layer Etching of Nickel Using N<sub>2</sub>/H<sub>2</sub> Plasma Exposure and Hexafluoroacetylacetone. [PDF]
Ali AM +7 more
europepmc +1 more source
A silicon microneedle array atmospheric pressure plasma ionization source for real-time trace gas chemical analysis. [PDF]
Chew BS +6 more
europepmc +1 more source
Synthesis and advanced applications of MXene nanosheets in energy storage, EMI shielding, and biomedicine: a review. [PDF]
Ghobashy MM +6 more
europepmc +1 more source
Wet etching of (-102) β-Ga<sub>2</sub>O<sub>3</sub> with tetramethylammonium hydroxide (TMAH). [PDF]
Oshima T.
europepmc +1 more source
Suspended Germanium-on-Silicon Photonic Integrated Circuits Operating in the Long-Wave Infrared and Their Use for Ethanol Sensing. [PDF]
Lin PS +4 more
europepmc +1 more source
Atomic Force Microscopy (AFM)-Based Metrology for Advanced Etching in Three-Dimensional Integrated Circuits. [PDF]
Chang J +4 more
europepmc +1 more source
Molecular dynamics simulation of atomic layer etching for sidewall damage recovery in GaN-based structures. [PDF]
Kim EK +13 more
europepmc +1 more source
CMOS-Compatible Fabrication Module for Sub-100 nm TiN and TaN Pillar Electrodes for Carbon Nanotube Test Structures. [PDF]
Chen G, Fujii T, Yamada T, Hata K.
europepmc +1 more source
Sputtering yield for metal halide perovskite devices patterning. [PDF]
Wu E +6 more
europepmc +1 more source
Photodissociation and electron-collision induced dissociation of C<sub>5</sub>H<sub>2</sub>F<sub>10</sub> using photoelectron-photoion coincidence spectroscopy and quantum chemistry. [PDF]
Tran NT +3 more
europepmc +1 more source

