Results 61 to 70 of about 4,565 (255)

Nanoimprint Lithography for Next-Generation Carbon Nanotube-Based Devices

open access: yesNanomaterials
This research reports the development of 3D carbon nanostructures that can provide unique capabilities for manufacturing carbon nanotube (CNT) electronic components, electrochemical probes, biosensors, and tissue scaffolds.
Svitlana Fialkova   +6 more
doaj   +1 more source

BiVO4 photoanodes for water splitting with high injection efficiency, deposited by reactive magnetron co-sputtering

open access: yesAIP Advances, 2016
Photoactive bismuth vanadate (BiVO4) thin films were deposited by reactive co-magnetron sputtering from metallic Bi and V targets. The effects of the V-to-Bi ratio, molybdenum doping and post-annealing on the crystallographic and photoelectrochemical ...
Haibo Gong   +4 more
doaj   +1 more source

Characterization of polycrystalline nickel cobaltite nanostructures prepared by DC plasma magnetron co-sputtering for gas sensing applications

open access: yesPhotonic Sensors, 2017
In this work, a gas sensor is fabricated from polycrystalline nickel cobaltite nano films deposited on transparent substrates by closed-field unbalanced dual-magnetrons (CFUBDM) co-sputtering technique. Two targets of nickel and cobalt are mounted on the
Oday A. Hammadi, Noor E. Naji
doaj   +1 more source

Label‐Free Detection of a Neurotransmitter Using an Aptamer‐Functionalized Amorphous IGZO Transistor

open access: yesAdvanced Materials Interfaces, EarlyView.
An aptamer‐functionalized amorphous IGZO thin‐film transistor enables label‐free electrical detection of the neurotransmitter serotonin under liquid‐gated operation. Stepwise surface functionalization ensures stable biomolecule integration and efficient electrostatic coupling.
Ngoc Thanh Ho   +3 more
wiley   +1 more source

Nanocolumnar TiN thin film growth by oblique angle sputter-deposition: Experiments vs. simulations

open access: yesMaterials & Design, 2018
Nanostructured columnar titanium nitride (TiN) thin films were produced by oblique angle deposition using reactive magnetron sputtering. The influence of the angular distribution of the incoming particle flux on the resulting film morphology (column tilt
Boudjemaa Bouaouina   +6 more
doaj   +1 more source

Gas‐Selective Remote Plasma Engineering of WO3 Photoanodes for Solar Water Splitting

open access: yesAdvanced Materials Interfaces, EarlyView.
Gas‐selective remote plasma treatment tunes the near‐surface defect chemistry of WO3 photoanodes without altering their bulk structure. Ar plasma generates the most oxygen‐vacancy‐rich surface and the highest W5+ content, delivering the strongest photocurrent.
Elham Jassemi Zargani   +5 more
wiley   +1 more source

Magnetic Droplet Manipulation on Open Surfaces

open access: yesAdvanced Materials Technologies, EarlyView.
Recent advances in the manipulation of magnetic droplets demonstrate various manipulations on open surfaces, including transport, splitting, merging, and force‐controlled motion, enabled by magnetic particles and external fields. ABSTRACT Manipulation of liquids on a smaller scale enables applications in various fields, particularly diagnostics and ...
Robab Jahangir, Vahid Nasirimarekani
wiley   +1 more source

Structural and Tribological Aspects on Ti (C,O,N) Magnetron Reactive Sputtered Thin-Films

open access: yesThe Annals of “Dunarea de Jos” University of Galati. Fascicle IX, Metallurgy and Materials Science, 2007
Magnetron sputtering is a flexible technique and allows producing a significant amount of types of coatings. Within the frame of present work, Ti-C-O-N thin films were deposited onto high-speed steel (AISI M2), substrates by reactive dc magnetron ...
Daniel MUNTEANU   +5 more
doaj  

Aluminum Oxynitride‐Engineered Transparent Aluminum Nitride Resistive Memory for Low‐Leakage Multilevel Switching in Micro‐LED Pixels

open access: yesAdvanced Materials Technologies, EarlyView.
An AlON interfacial layer is engineered within an AlN switching layer to enable transparent RRAM with four stable resistance states. The device achieves low‐voltage multilevel switching and a high HRS, allowing precise grayscale modulation and preventing light leakage in micro‐LEDs operated at VDD = 2.7 V.
Sung Keun Choi   +7 more
wiley   +1 more source

Modeling the reactive magnetron sputtering process

open access: yes, 2015
Reactive magnetron sputtering is a versatile plasma technique to deposit thin layers of compound material on all kind of objects. The purpose of these thin films is to add or enhance interesting properties to the object. The term ``thin'' should here be interpreted as ranging from a few nanometers up till several microns.
openaire   +2 more sources

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