Results 1 to 10 of about 11,680 (163)
Modeling of Reactive Sputtering-History and Development. [PDF]
Materials (Basel), 2023 This work critically reviews the evolution of reactive sputtering modeling that has taken place over the last 50 years. The review summarizes the main features of the deposition of simple metal compound films (nitrides, oxides, oxynitrides, carbides, etc.) that were experimentally found by different researchers.
Shapovalov VI.
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Large Area High‐Performance Thin Film Solid Oxide Fuel Cell with Nanoscale Anode Functional Layer by Scalable Reactive Sputtering [PDF]
Advanced ScienceFor high‐performance thin‐film solid oxide cells (TF‐SOCs), a nanostructured anode functional layer (n‐AFL) that can prolong the triple‐phase boundary (TPB) is crucial, particularly for low‐temperature operation.
Kyoungjae Ju +14 more
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Reactive Sputtering of Aluminum Nitride (002) Thin Films for Piezoelectric Applications: A Review [PDF]
Sensors, 2018 We summarize the recipes and describe the role of sputtering parameters in producing highly c-axis Aluminum Nitride (AlN) films for piezoelectric applications.
Abid Iqbal, Faisal Mohd-Yasin
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Reactive sputtering deposition of SiO2 thin films [PDF]
Journal of the Serbian Chemical Society, 2008 SiO2 layers were deposited in a UHV chamber by 1 keV Ar+ ion sputtering from a high purity silicon target, using different values of the oxygen partial pressure (5×10-6-2×10-4 mbar) and of the ion beam current on the target (1.67-6.85 mA).
Radović Ivan +3 more
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Model of Reactive Magnetron Sputtering of a Two-Component Composite Target
Доклады Белорусского государственного университета информатики и радиоэлектроники, 2023 The article proposes a model for predicting the content of metal components of complex oxide films deposited by reactive magnetron sputtering of a two-component composite target in Ar/O2 gas mixture.
H. T. Doan +5 more
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The Effect of Plasma Activation of Reactive Gas in Reactive Magnetron Sputtering
East European Journal of Physics, 2023 The effect of plasma activation of reactive gas on the process of reactive magnetron synthesis of oxide coatings was theoretically and experimentally investigated using a radio-frequency inductively coupled plasma source, which creates a flow of ...
Stanislav V. Dudin +2 more
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Medžiagotyra, 2016 Reactive sputter processes frequently exhibit stability problems. The cause of this is that these processes normally exhibit hysteresis effects in the processing curves.
He YU +4 more
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Structural And Optical Properties Of VOx Thin Films
Archives of Metallurgy and Materials, 2015 VOx thin films were deposited on Corning glass, fused silica and Ti foils by means of rf reactive sputtering from a metallic vanadium target. Argon-oxygen gas mixtures of different compositions controlled by the flow rates were used for sputtering ...
Schneider K.
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EUROPIUM SILICATE THIN FILMS FABRICATED BY RF MAGNETRON SPUTTERING AND THERMAL TREATMENT
ASEAN Journal on Science and Technology for Development, 2017 We report the fabrication and optical characteristics of europium silicate thin films. Layer structures of Eu2O3/SiOX/Si (100) were deposited by an rf-sputtering method and annealed at 1100°C by rapid thermal annealing (RTA).
Young Chul Shin +2 more
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TiO2/CuO/Cu2O Photovoltaic Nanostructures Prepared by DC Reactive Magnetron Sputtering
Nanomaterials, 2022 In this study, titanium dioxide/copper oxide thin-film solar cells were prepared using the reactive direct-current magnetron sputtering technique.
Grzegorz Wisz +9 more
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