Results 21 to 30 of about 22,223 (308)

Pulsed DC reactive sputtering using a conducting target: A strong method to produce high-quality BiFeO3-based multiferroic thin films

Chemical Physics Impact
Magnetoelectric multiferroic thin films are considered crucial for the development of next generation magnetic devices with low power consumption. This is due to the coexistence of ferroelectricity and ferromagnetism in the same phase, which enables its ...
Swati Sucharita Das, Genta Egawa, Satoru Yoshimura   +2 more
doaj   +1 more source

Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films

Results in Physics, 2017
Titanium dioxide (TiO2) films with thicknesses around 300 nm were deposited on glass substrates by reactive radio frequency (RF) magnetron sputtering at constant RF sputtering power (200 W), high sputtering pressure and room temperature.
A.R. Grayeli Korpi, Sahare Rezaee, C. Luna, Ş. Ţălu, A. Arman, A. Ahmadpourian   +5 more
doaj   +1 more source

Preparation and properties of TiN films under different sputtering pressure

Xi'an Gongcheng Daxue xuebao, 2023
In order to study the properties of TiN films, especially the infrared emission properties, TiN films were prepared by reactive DC magnetron sputtering under different sputtering pressures (0.1 Pa, 0.3 Pa, 0.5 Pa, 0.7 Pa) using Ti target as sputtering ...
XU Jie, GAO Miao, WANG Jiyun, ZHANG Xudong, LU Linlin   +4 more
doaj   +1 more source

Disorder-free sputtering method on graphene

AIP Advances, 2012
Deposition of various materials onto graphene without causing any disorder is highly desirable for graphene applications. Especially, sputtering is a versatile technique to deposit various metals and insulators for spintronics, and indium tin oxide to ...
Xue Peng Qiu, Young Jun Shin, Jing Niu, Narayanapillai Kulothungasagaran, Gopinadhan Kalon, Caiyu Qiu, Ting Yu, Hyunsoo Yang   +7 more
doaj   +1 more source

Reactive high power impulse magnetron sputtering

, 2019
Reactive magnetron sputtering is essential in many industrial processes where it is applied to deposit compound films or coatings. Reactive sputtering is attractive because a range of compounds can be prepared from a low-cost metal target by addition of ...
Kubart, T., Gudmundsson, Jon Tomas,, Tomáš Kubart, Jon Tomas Gudmundsson, Lundin, Daniel,, Lundin, D., Daniel Lundin, Kubart, Tomas,   +7 more
core   +1 more source

Modeling the stability of reactive sputtering processes

, 2022
S.192-200Reactive sputtering of metal targets in a working gas / reactive gas mixture is a favorable method for the deposition of compound layers like oxides.
Frach, P., Bartzsch, H.
core   +1 more source

SYSTEM OF STABILIZATION OF REACTIVE MAGNETRON SPUTTERING PROCESS

Приборы и методы измерений, 2018
Film coatings today allow to create large number of diverse structures in electronics, microelectronics, optics, architecture and construction. Leading technologies in this area are magnetron deposition technologies.
A. P. Burmakou, V. N. Kuleshov, A. V. Stoliarov   +2 more
doaj   +1 more source

Effect depositions parameters on the characteristics of Ni0.5Co0.5Fe2O4 nanocomposite films prepared by DC reactive magnetron Co-Sputtering technique

Iraqi Journal of Physics, 2020
In this work, spinel ferrites (NiCoFe2O4) were prepared as thin films by dc reactive dual-magnetron co-sputtering technique. Effects of some operation parameters, such as inter-electrode distance, and preparation conditions such as mixing ratio of argon
Tawfiq S. Mahdi, Firas J. Kadhim
doaj   +1 more source

Moderate temperature deposition of RF magnetron sputtered SnO2-based electron transporting layer for triple cation perovskite solar cells

Scientific Reports, 2023
The perovskite solar cells (PSCs) are still facing the two main challenges of stability and scalability to meet the requirements for their potential commercialization.
Y. Zakaria, B. Aïssa, T. Fix, S. Ahzi, S. Mansour, A. Slaoui   +5 more
doaj   +1 more source

RF Magnetron Sputtering Aluminum Oxide Film for Surface Passivation on Crystalline Silicon Wafers

International Journal of Photoenergy, 2013
Aluminum oxide films were deposited on crystalline silicon substrates by reactive RF magnetron sputtering. The influences of the deposition parameters on the surface passivation, surface damage, optical properties, and composition of the films have been ...
Siming Chen, Luping Tao, Libin Zeng, Ruijiang Hong   +3 more
doaj   +1 more source