Results 11 to 20 of about 22,223 (308)
Water vapor in DC reactive magnetron sputtering plasma : characteristics and applications [PDF]
, 2023 DC反応性マグネトロンスパッタリングにおける水蒸気プラズマを用いた酸化亜鉛薄膜の成膜について、薄膜成膜とプラズマソースでの検討を行いました。DCマグネトロンスパッタリングプラズマの特性は、ターゲット表面、基板蒸着領域、バルクプラズマの3つの重要な領域で詳細に調査しました。プラズマソースからの制御された輸送は、パルス化されたコンジットタイプの取り出し電極まで拡張しました。プラズマにさらされた表面への水の吸着とプラズマ中の負イオンの存在は、局所的なプラズマパラメータに大きな影響を与えました。The ...
31069 +2 more
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Dry etching and sputtering [PDF]
, 2003 Dry etching is an important process for micro- and nanofabrication. Sputtering effects can arise in two contexts within a dry-etch process. Incoming ions cause removal of volatile products that arise from the interaction between the dry-etch plasma and ...
Wilkinson, C.D.W. +3 more
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Effects of total gas flow rate and sputtering power on the critical condition for target mode transition in Al?O2 reactive sputtering [PDF]
, 2009 Reactive sputtering is one of the most commonly used techniques for the fabrication of compound thin films, and the critical condition for target mode transition from metal mode to oxide mode is very important.
Kawamura, M, Sasaki, K, Chiba, Y, Abe, Y
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Reactive sputtering of molybdenum
Thin Solid Films, 1990 Abstract The composition and crystalline structure of molybdenum oxide thin films is controlled through the process of reactive d.c. magnetron sputtering. A systematic variation in target power density results in a continuous transition in the appearance of molybdenum oxide from a translucent glass to a metallic-like film.
A.F. Jankowski, L.R. Schrawyer
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Formation process of Al2O3 thin films by reactive sputtering [PDF]
, 2008 Al and Al2O3 films were deposited by RF magnetron sputtering using a mixed gas of Ar and O2. The surface of the Al target was changed from the metallic mode to the oxide mode at a critical O2 flow ratio of 8%.
Kawamura, M, Sasaki, K, Chiba, Y, Abe, Y
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Journal of Industrial Textiles, 2022 Adopting magnetron sputtering continuous automatic production line equipment for industrial production, polyester fabrics as the substrates were coated with nano-Ag/TiO 2 composite films prepared by direct current sputtering method and direct current ...
Xiaohong Yuan +5 more
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Structure characterization and tribological study of magnetron sputtered nanocomposite nc-TiAlV(N, C)/a-C coatings [PDF]
, 2011 Grown by reactive unbalanced magnetron sputtering in a mixed N2 and CH4 gaseous medium, heterogeneous nanocomposite coatings in the Ti-Al-V-N-C system show extraordinarily excellent tribological performance of coated machining tools.
Chen, Linghao +11 more
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Fabrication of atomically abrupt interfaces of single-phase TiH2 and Al2O3
APL Materials, 2017 We report the fabrication of atomically abrupt interfaces of titanium dihydride (δ-TiH2) films and α-Al2O3(001) substrates. With the assistance from reactive hydrogen in plasma, single-phase δ-TiH2 epitaxial thin films were grown on α-Al2O3(001 ...
Ryota Shimizu +7 more
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Development of innovative coatings for sun protection glasses based on the theory of the optimal spectral transmittance [PDF]
, 2008 In this work new coatings for sun protection glasses for windows and glass facades were developed. These coatings improve the reduction of the energy input by solar radiation in comparison to the best sun protection glasses on the market. They reduce the
Mack, Iris
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MATEC Web of Conferences, 2016 Under various power ratios and temperatures, Inxga1-xN films with different indium composition x were grown on Si(111) substrates by reactive magnetron sputtering, and then annealed at ammonia atmosphere around 700°C for 2 hours. The indium composition x
Wang Xuewen +5 more
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