Results 41 to 50 of about 22,223 (308)

Tailoring Functional Properties of Ti–Ni–Cu Shape Memory Alloy Thin Films for MEMS Actuators

Advanced Engineering Materials, EarlyView.
A comprehensive study of critical parameters required to develop well‐performing Ti–Ni–Cu thin film shape memory alloy microactuators is provided. Materials science and device integration aspects are integrated by addressing structural and physical relationships using complementary characterization techniques as well as a practical fabrication solution
Elaheh Akbarnejad, Aleksander Kostka, Gowtham Arivanandhan, Yujiao Li, Alan Savan, Manfred Kohl, Alfred Ludwig   +6 more
wiley   +1 more source

Target-Surface Compound Layers Formed by Reactive Sputtering of Si Target in Ar+O2 and Ar+N2 Mixed Gases [PDF]

, 2007
Reactive sputtering is a very useful and widely used technique for preparing compound thin films, however, the target surface state is not fully understood.
Takisawa, Takaya, Sasaki, Katsutaka, Abe, Yoshio, Kawamura, Midori   +3 more
core  

Direct Metal Deposition of Graphene–Ti28Nb35.4Zr Matrix Composites With Enhanced Mechanical, Corrosion, and Biocompatibility Properties for Bone Implants

Advanced Engineering Materials, EarlyView.
Graphene nanoplatelet (0.1 wt.%) reinforcement significantly enhances the performance of β Ti‐28Nb‐35.4Zr alloy. Grain refinement, reduced water contact angle, and improved surface characteristics promote osteoblast adhesion and complete surface coverage after 7 days.
Khurram Munir, Jixing Lin, Yuncang Li, Li Zhu, Paul F. A. Wright, Cuie Wen   +5 more
wiley   +1 more source

Reactive Gas Pulsing Process for Oxynitride Thin Films [PDF]

, 2013
An original reactive sputtering method, namely the reactive gas pulsing process (RGPP) was developed for the synthesis of titanium oxynitride thin films.
MARTIN, Nicolas, BESNARD, Aurélien, STAHL, Fabrice, LINTYMER, Jan   +3 more
core  

OPTICAL CHARACTERISTICS OF ALN THIN FILMS DEPOSITED BY DC MAGNETRON AND ION-BEAM SPUTTERING STUDY

Доклады Белорусского государственного университета информатики и радиоэлектроники, 2019
This paper studies the optical characteristics of aluminum nitride thin films deposited by reactive magnetron and ion-beam sputtering. The dependences of the refractive index and absorption coefficient of the films on the percentage of nitrogen in the ...
M. V. Ermolenko, A. P. Dostanko, D. A. Golosov, S. M. Zavadskiy   +3 more
doaj  

Déposition par Pulvé Risation Cathodique Radio Fréquence et Caracté Risation Électronique, Structurale et Optique de Couches Minces du Dioxyde de Titane

Active and Passive Electronic Components, 2004
Deposited titanium oxide thin films are used as optical protector films for several materials and as energy converters for solar cells. In this work, titanium oxide thin films are deposited on c-Si and glass substrates by reactive radiofrequency ...
K. Hafidi, M. Azizan, Y. Ijdiyaou, E. L. Ameziane   +3 more
doaj   +1 more source

Electrochemical Behavior of Flame‐Sprayed Sc‐Doped AlCoCrFeMo High‐Entropy Alloy Coatings in 3.5% Sodium Chloride Solution

Advanced Engineering Materials, EarlyView.
Scandium (Sc)‐doped AlCoCrFeMo HEA coatings are fabricated via flame spraying with 0.1, 0.3, and 0.5 wt% Sc additions. Among these, the HEA‐Sc0.3 coating exhibits the highest corrosion resistance, indicated by a more positive corrosion potential and lower current density.
Pankaj Kumar, Akash Vyas, Mohammad Aatif Qazi, Nashit Jalal, Maria Ophelia Jarligo, Mostafa Yakout, Jing Liu, André McDonald   +7 more
wiley   +1 more source

Evaluation of titanium dioxide and tantalum pentoxide nanoparticles for coating NiTi archwires in orthodontics: An in vitro study

Journal of Baghdad College of Dentistry
Background: This study aims to enhance the biocompatibility of Nickel–Titanium (NiTi) alloy by developing a new coating using titanium dioxide (TiO2) and titanium pentoxide (Ta2O5) through direct current (DC) reactive sputtering technology.
Abeer B Mahmood, Akram F Alhuwaizi, Mohammed K Khalaf, Abbas R Zaher   +3 more
doaj   +1 more source

Controlled formation of anatase and rutile TiO2 thin films by reactive magnetron sputtering

AIP Advances, 2015
We discuss the formation of TiO2 thin films via DC reactive magnetron sputtering. The oxygen concentration during sputtering proved to be a crucial parameter with respect to the final film structure and properties.
Damon Rafieian, Wojciech Ogieglo, Tom Savenije, Rob G. H. Lammertink   +3 more
doaj   +1 more source

Cathodic Cage Plasma Deposition of Nanostructured Cu–Fe–Se Coatings on Poly(methyl Methacrylate)

Advanced Engineering Materials, EarlyView.
Nanostructured Cu–Fe–Se coatings are deposited on PMMA by a modified cathodic cage plasma process, enabling low‐temperature deposition on polymer substrates. A transition from discontinuous to compact morphology is observed with temperature, with optimal properties at 200°C, where improved CuFeSe2‐type bonding, lowest sheet resistance, and favorable ...
V. S. S. Sobrinho, M. Naeem, T. H. C. Costa, M. S. Libório, J. C. A. Queiroz, C. B. B. Luna, R. R. M. Sousa, P. S. Vieira, E. M. Araújo   +8 more
wiley   +1 more source