Results 91 to 100 of about 1,828 (206)
Exhaustive studies in the literature detail the Mueller matrices properties through decomposition, optical entropy and depolarization formalism. It has been applied for many years in rather different fields. In radar polarimetry, mathematical basis of
Ferrieu. F.
doaj +1 more source
Quantifying parameter uncertainties in optical scatterometry using Bayesian inversion
We present a Newton-like method to solve inverse problems and to quantify parameter uncertainties. We apply the method to parameter reconstruction in optical scatterometry, where we take into account a priori information and measurement uncertainties ...
Santiago, Xavier Garcia +5 more
core +1 more source
Laser-Driven Light Sources for Nanometrology Applications
Laser-driven light sources (LDLS) have ultrahigh-brightness and broad wavelength range. They are ideal radiation sources for optical metrology tools for advanced process control in semiconductor manufacturing.
Huiling Zhu, Paul Blackborow
doaj +1 more source
Real-time profile shape reconstruction using dynamic scatterometry [PDF]
International audienceIn-line process control in microelectronic manufacturing requires real-time and non-invasive monitoring techniques. Among the different metrology techniques, the scatterometry, based on the ellipsometric signatures (i.e stokes ...
Besacier, Maxime +8 more
core +1 more source
Time-domain Statistics of the Electromagnetic Bias in GNSS-Reflectometry
Global Navigation Satellite Systems-Reflectometry (GNSS-R) is an emerging remote sensing technique that uses navigation signals reflected on the Earth’s surface as sources of opportunity for scatterometry and altimetry.
Ali Ghavidel, Adriano Camps
doaj +1 more source
This paper deals with the sea scatterometry, i.e. with the physical principles and techniques which permit to a scatterometer to perform radar measurements such as to allow the sea surface wind field retrieval.
MIGLIACCIO, Maurizio
core
Real time scatterometry for profile control during resist trimming process
International audienceIn situ and real time control of the different process steps in semiconductor device manufacturing becomes a critical challenge, especially for the lithography and plasma etching processes.
Soulan, S. +11 more
core +1 more source
Een veelheid aan meteorologische metingen is dagelijks beschikbaar. De meeste van deze waarnemingen bevinden zich echter boven land, en met name windwaarnemingen boven de (Noord Atlantische) oceaan zijn schaars. Bij een westelijke luchtstroming is dit een duidelijke beperking voor de weers- en golfverwachtingen ten behoeve van Nederland.
openaire +2 more sources
METHODOLOGY OF THE ASSESSMENT OF THE ABRASIVE TOOL’S ACTIVE SURFACE USING LASER SCATTEROMETRY
Diagnostics of abrasive tools requires the use of modern measurement techniques which allows for fast assessment of a surface in order to determine, for example, the degree of its wear or to detect various type of defects.
Krzysztof Nadolny +2 more
core +1 more source
Multiwavelength optical scatterometry of dielectric gratings
Modern scatterometry problems arising in the lithography production of periodic gratings are in the focus of the work. The performance capabilities of a novel theoretical and numerical modeling oriented to these problems are considered.
Yashina, Nataliya P. +3 more
core +1 more source

