Real time scatterometry: a new metrology for in situ microelectronics process control
, 2010 In situ and real time control of the different process steps in semiconductor device manufacturing becomes a critical challenge, especially for the lithography and plasma etching processes.
Besacier, Maxime +3 more
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Optical scatterometry with relaxed model constraints
Optics ExpressOptical scatterometry extracts structural and material properties of nanostructures from optical signal by solving the optical inverse problems (OIPs). It typically requires prior information for the establishment of structural models. Existing modeling methods are almost based on strict model constraints, which may oversimplify structural details ...
Ang Jiang +7 more
openaire +2 more sources
Measuring multiple nano-textured areas simultaneously with imaging scatterometry
, 2017 Periodic nano- Textured surfaces have been characterised using the new optical imaging scatterometry technique. A major benefit of imaging scatterometry compared to traditional scatterometry is that an area much smaller than the illuminated area can be ...
Nygård, Jesper +4 more
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Editorial: The human brain multiscale imaging challenge. [PDF]
Front Neuroanat, 2022 Costantini I, Axer M, Magnain C, Hof PR.
europepmc +1 more source
Polarized iridescence of the tropical carpenter bee, Xylocopa latipes. [PDF]
J Comp Physiol A Neuroethol Sens Neural Behav Physiol, 2023 Stavenga DG, Kats K, Leertouwer HL.
europepmc +1 more source
Scatterometry of diffraction gratings: Time-and-frequency domains technique
, 2013 The paper discusses capabilities of a novel theoretical and numerical-modeling based approach to scatterometry problems. This approach allows reliable detection of deviations in gratings' critical dimensions during manufacturing process.
Yashina, Nataliya +3 more
core
Directional thermal channeling: A phenomenon triggered by tight packing of heat sources. [PDF]
Proc Natl Acad Sci U S A, 2021 Honarvar H +8 more
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Immersion Scatterometry for Nanoscale Grating Topography Extraction. [PDF]
The objective of optical scatterometry is to determine the geometrical parameters of a periodic structure, such as a surface-relief grating, from its ellipsometric spectrum.
Liu, Elson Yee-Hsin
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Using light and X-ray scattering to untangle complex neuronal orientations and validate diffusion MRI. [PDF]
Elife, 2023 Menzel M +4 more
europepmc +1 more source
EUV reflectometry and scatterometry for thin layer and periodic structure characterization
Non-destructive nano-metrology is a fundamental tool for semiconductor device manufacturing. Practically, a combination of several metrology techniques is needed throughout the fabrication process of semiconductor chips, from EUV photomask inspection to ...
Jeong, Dongmin (author) +5 more
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