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Measurement precision of optical scatterometry
SPIE Proceedings, 2001In the work reported here, we discuss the measurement precision of two scatterometry techniques, the variable angle and the variable wavelength techniques. The issue of interest is the measurement precision of the sample parameters. This is determined by both the sensitivity of the diffraction measurable to changes in sample parameters and the ...
Petre-Catalin Logofatu, John R. McNeil
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Scatterometry of honed surfaces
Optical Engineering, 1998A method that was originally developed for the investigation of microstructures has been adapted to the measurement of rough tech- nical surfaces. Based on a combination of angular resolved light scatter- ing measurement with a data analysis by linear multivariate regression, almost any surface parameter can be estimated.
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Sensitivity analysis of fitting for scatterometry
SPIE Proceedings, 1999The sensitivity analysis of fitting (SAF) is a formalism that determines the type of measurements that yields optimum determination precision. SAF is applied to ellipsometric- scatterometry of surface relief gratings and for the optimum measurement configuration predicts a significant improvement compared to the conventional scatterometry measurement ...
Petre-Catalin Logofatu, John R. McNeil
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2015
An ocean scatterometer is an active microwave instrument which is designed to determine the normalized radar cross section (NRCS) of the sea surface. Scatterometers transmit pulses towards the sea surface and measure the reflected energy. The primary objective of spaceborne scatterometers is to measure near-surface winds over the ocean.
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An ocean scatterometer is an active microwave instrument which is designed to determine the normalized radar cross section (NRCS) of the sea surface. Scatterometers transmit pulses towards the sea surface and measure the reflected energy. The primary objective of spaceborne scatterometers is to measure near-surface winds over the ocean.
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Optical scatterometry for process metrology
SPIE Proceedings, 1999The intensity of radiation diffracted from periodic structures is extremely sensitive to slight variations in the geometry and composition of the diffracting structure. Rigorous diffraction theory provides a mechanism for accurate analysis of the scattered waves.
S. Sohail H. Naqvi, John R. McNeil
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Use of scatterometry in photomask metrology
Optical Society of America Annual Meeting, 1992The microelectronics industry has demonstrated the need for device structure characterization during photomask processing since the line quality on a lithographic mask is critical to the eventual device quality and reliability. Applying laser scatterometry as a characterization technique for measuring line edge roughness on photomasks partially ...
Susan M. Gaspar +5 more
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Neural network assisted multi-parameter global sensitivity analysis for nanostructure scatterometry
Applied Surface Science, 2021Kamal Youcef-Toumi, Kai Meng
exaly
Machine learning aided solution to the inverse problem in optical scatterometry
Measurement: Journal of the International Measurement Confederation, 2022Shiyuan Liu, Xiuguo Chen, Chuanwei Zhang
exaly