Results 21 to 30 of about 1,939,285 (262)

Investigation of 3.3 kV 4H-SiC DC-FSJ MOSFET Structures

open access: yesMicromachines, 2021
This research proposes a novel 4H-SiC power device structure—different concentration floating superjunction MOSFET (DC-FSJ MOSFET). Through simulation via Synopsys Technology Computer Aided Design (TCAD) software, compared with the structural and static ...
Chia-Yuan Chen   +4 more
doaj   +1 more source

Charge Sheet Super Junction in 4H-Silicon Carbide: Practicability, Modeling and Design

open access: yesIEEE Journal of the Electron Devices Society, 2020
We discuss details of the Charge Sheet SuperJunction (CSSJ) in 4H-Silicon Carbide (SiC). This device was earlier proposed in Si material. A CSSJ is obtained by replacing the p-pillar of a SJ by a bilayer insulator, e.g., Al2O3/SiO2; the inter-layer ...
K. Akshay, Shreepad Karmalkar
doaj   +1 more source

A High-Performance SiC Super-Junction MOSFET With a Step-Doping Profile

open access: yesIEEE Journal of the Electron Devices Society, 2021
In this article, we investigate a 4H-SiC super- junction (SJ) MOSFET structure with a charge-imbalance doping-profile. According to our numerical simulations and comparisons with the conventional SiC VDMOS (C-VDMOS) and SiC SJ VDMOS (SJ-VDMOS) devices ...
Hao Huang   +6 more
doaj   +1 more source

Study of High-Performance GaN-Based Trench CAVET with Stepped Doping Microstructure

open access: yesMicromachines, 2022
In this article, an innovative GaN-based trench current-aperture vertical electron transistor (CAVET) with a stepped doping microstructure is proposed and studied using Silvaco-ATLAS.
Yuan Li   +3 more
doaj   +1 more source

150–200 V Split-Gate Trench Power MOSFETs with Multiple Epitaxial Layers

open access: yesMicromachines, 2020
A rating voltage of 150 and 200 V split-gate trench (SGT) power metal-oxide- semiconductor field-effect transistor (Power MOSFET) with different epitaxial layers was proposed and studied.
Feng-Tso Chien   +5 more
doaj   +1 more source

A Zero-Cost Technique to Improve ON-State Performance and Reliability of Power LDMOS Transistors

open access: yesIEEE Journal of the Electron Devices Society, 2021
In this paper, we have proposed a simple and zero-cost technique to improve ON-state and reliability performance of LDMOS transistors. We introduced doping gradient in the channel by optimizing position of the P-Well mask during test structure design ...
Kumari Neeraj Kaushal   +1 more
doaj   +1 more source

Reducing specific on-resistance for a trench SOI LDMOS with L-shaped P/N pillars

open access: yesResults in Physics, 2020
To reduce specific on-resistance (Ron,sp) of power devices, a novel SOI (silicon-on-insulator) trench gate LDMOS with heavily doping L-shaped P/N pillars and vertical dual-trench-gates is proposed in this paper, and its physical mechanism and electrical ...
Jingwei Guo   +6 more
doaj   +1 more source

Analyses and Experiments of Ultralow Specific On-Resistance LDMOS With Integrated Diodes

open access: yesIEEE Journal of the Electron Devices Society, 2021
An ultralow specific on-resistance ( ${R} _{\mathrm{ on,sp}}$ ) accumulation-mode LDMOS (ALDMOS) is proposed and investigated by simulations and experiments.
Jie Wei   +6 more
doaj   +1 more source

Note Clarifying the Paper, “Charge Sheet Super Junction in 4H-Silicon Carbide: Practicability, Modeling and Design”

open access: yesIEEE Journal of the Electron Devices Society, 2020
This note clarifies an important approximation used to simulate the breakdown field in the SiO2 liner of a SiC Charge-Sheet Superjunction - a new power device structure - reported by Akshay and Karmalkar (2020).
K. Akshay, Shreepad Karmalkar
doaj   +1 more source

A Uni-gate vertical power MOSFET with improved figure of Merits: Design and analysis

open access: yesAlexandria Engineering Journal, 2023
In this paper, we propose and analyze a single buried gate power MOSFET structure. The structure uses single gate buried under the source and channel region with its dimensions optimized to get the best Ron-BV tradeoff. The device exhibits a good scaling
Hafsa Nigar   +3 more
doaj   +1 more source

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