Results 111 to 120 of about 3,818 (150)
Some of the next articles are maybe not open access.
Spectroscopic ellipsometry—A perspective
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films, 2013Since its initial development in the early 1970s, spectroscopic ellipsometry (SE) has become the primary technique for determining optical properties of materials. In addition to the other historic role of ellipsometry, determining film thicknesses, SE is now widely used to obtain intrinsic and structural properties of homogeneous and inhomogeneous ...
openaire +1 more source
In-situ spectroscopic ellipsometry of HgCdTe
Journal of Electronic Materials, 1996An in-situ spectroscopic ellipsometer has been equipped on a molecular beam epitaxy system to improve control of HgCdTe growth. Using this device, in-situ analysis of composition, growth rate, and surface cleanliness were monitored. A real time model which determined the compositional profile was used. The ellipsometer was employed to give in-situ real
J. D. Benson +11 more
openaire +1 more source
Spectroscopic ellipsometry on 1T-TiSe2
Thin Solid Films, 1993Abstract Ellipsometric measurements of the quasi-two-dimensional layered compound TiSe2, over the spectral range 1 ...
T. Buslaps, R.L. Johnson, G. Jungk
openaire +1 more source
Spectroscopic Ellipsometry of CVD Graphene
ECS Meeting Abstracts, 2011Abstract not Available.
Florence Nelson +5 more
openaire +1 more source
Characterization of Cu2SnSe3 by spectroscopic ellipsometry
Thin Solid Films, 2013Abstract Spectroscopic ellipsometry has been used to characterize the dielectric functions of bulk Cu 2 SnSe 3 crystals, grown by modified Bridgman technique. Spectral measurements were performed at room temperature over the energy range 1.0 to 4.7 eV.
G. Gurieva +6 more
openaire +1 more source
Reality and Limits of Spectroscopic Ellipsometry
Optical Interference Coatings, 1988Ellipsometry is widely used for measurement of thin films. Usually instruments can only give index of refraction and thickness of one transparent layer at one wavelength. In order to know more about the layer two techniques have been developed recently; one is exploration of the spectral information covering the useful range from .23 up to 1.7μm.
J.L. Stehle, F. Bernoux, O. Thomas
openaire +1 more source
Spectroscopic ellipsometry: a historical overview
Thin Solid Films, 1998Abstract The historical development of spectroscopic ellipsometry (SE) from the very early stages to the present will be briefly reviewed. It is shown that SE is a truly powerful technique of great interest and use to physicists, chemists, electrochemists, electrical and chemical engineers, etc., as will be evident from the following few of the many ...
openaire +1 more source
Spectroscopic Ellipsometry of Surface Plasmons
2019 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC), 2019When plasmons are excited on metal surfaces, the electron system of the investigated sample is perturbed initiating changes in the dielectric function. Revealing these changes are crucial to design plasmonic components for ultrafast nanooptical switches, sensors or plasmonic circuits.
J. Budai, Z. Papa, J. Csontos, P. Dombi
openaire +1 more source
A Surface Scientist’s View on Spectroscopic Ellipsometry
2013Nowadays, a broad choice of instruments, including dedicated synchrotron radiation beamlines, allows to exploit Spectroscopic Ellipsometry (SE) to investigate the thickness and the dielectric properties of thin films, from the terahertz down to the VUV wavelength range.
openaire +1 more source
Advances in multichannel spectroscopic ellipsometry
Thin Solid Films, 1998Abstract Since the development and perfection of automatic ellipsometers, an effort that began nearly three decades ago, spectroscopic ellipsometry (SE) has increased in popularity as a non-destructive tool for characterizing the optical properties and layered structure of bulk solids and thin films.
R.W Collins +6 more
openaire +1 more source