Results 151 to 160 of about 5,235 (192)

Adsorption of Tetramethylammonium Hydroxide on Activated Carbon

Journal of Environmental Engineering, 2012
Tetramethylammonium hydroxide (TMAH) is widely used in manufacturing thin-film transistor liquid crystal displays (TFT-LCD) and semiconductors.
Prahas, D., Liu, J.C., Ismadji, S., Wang, M.-J.   +3 more
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Effect of tetramethylammonium hydroxide on cotton cellulose compared to sodium hydroxide

Macromolecular Chemistry and Physics, 2000
Cotton fabric was treated with aqueous solutions of tetramethylammonium hydroxide (TMAH) and sodium hydroxide of various concentrations. The sorption of both chemicals, the specific weight of the fabric, the cellulose I - cellulose II transition, the BET surface area, the iodine sorption capacity, and the water retention value were measured and ...
Ildiko Tanczos, Judit Borsa, István Sajó, Krisztina László, Zilia Abigel Juhász, Tünde Tóth   +5 more
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Siliceous and dolomitic-bearing aggregates reaction in Tetramethylammonium hydroxide

Construction and Building Materials, 2021
Abstract Due to argillaceous dolomitic limestones usually contain more or less quartz or micro-crystalline quartz, based on existence of alkali-silica gels in concretes with dolomitic aggregates, lead to alkali-carbonation reaction (ACR) coexists with alkali-silica reaction (ASR) in concrete.
Bi Chen, Min Deng, Xiaojun Huang, Liwu Mo, Bei Huang, Xianghui Lan   +5 more
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Corrosion of porous silicon in tetramethylammonium hydroxide solution

Corrosion Science, 2014
Abstract Corrosion of porous silicon in tetramethylammonium hydroxide (TMAH) solution was studied using weight loss measurements and scanning electron microscope. The effects of temperature, concentration of TMAH and volume ratio of ethanol in 1.0 M TMAH on corrosion rate and corrosion time were elaborately investigated.
Chuan Lai, Xue-Ming Li, Li-Ke Zou, Qiang Chen, Bin Xie, Yu-Lian Li, Xiao-Lin Li, Zhi Tao   +7 more
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Synthesis of Polydiethyoxylsiloxane Catalyzed by Dehydrated Tetramethylammonium Hydroxide

Advanced Materials Research, 2012
Tetramethylammonium hydroxide (TMAH) was dehydrated, and then used to catalyze the dimethyl cyclic siloxane ring cleavage and polymerize. The ethanol was used as both the solvent of TMAH and the capping agent to terminate the polymerization. Thus the high quality polydimethylsiloxane was synthesised. The influence of the amount of hexamethyl disiloxane
Xiao Deng Yang, Jian Cheng Wang, Qiu Tian Wang   +2 more
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A Raman Study of Etching Silicon in Aqueous Tetramethylammonium Hydroxide

Journal of The Electrochemical Society, 1998
The silicon etching process in tetramethylammonium hydroxide (TMAH) has been characterized using Raman scattering measurements. The measurements were carried out for 20 and 2% TMAH at different temperatures and for 20% TMAH in situ during the etching process.
P. T. Michaud, D. Babic
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Thermally assisted methylation of glycerol by tetramethylammonium hydroxide thermochemolysis

Journal of Analytical and Applied Pyrolysis, 2016
A novel method to rapidly methylate glycerol and generate products having greater value has been demonstrated using tetramethylammonium hydroxide (TMAH) thermochemolysis. Through analysis with GC–MS, it is shown that the reaction between TMAH and glycerol at elevated temperatures produces a series of mono, di and tri-methoxylated glycerols with ...
Derek C. Waggoner, Patrick G. Hatcher
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Experimental Characterization of the Si/Al/Tetramethylammonium Hydroxide System

Journal of The Electrochemical Society, 2001
Electrochemical measurements were used to determine the open-circuit potentials (OCP) of Si/tetramethylammonium hydroxide (TMAH) and Al/Si/TMAH systems. The OCP of Al/Si/TMAH and Si/TMAH were found to be in general agreement with the results obtained by other researchers using linear sweep voltammetry.
A. Tashtoush, L. M. Landsberger, A. Essalik, M. Kahrizi, M. Paranjape, J. F. Currie, A. Pandy   +6 more
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Reduced Anisotropy in Tetramethylammonium Hydroxide Based Silicon Etchants

ECS Transactions, 2017
At sub-10 nm technology nodes, silicon etching is critical to FEOL processes such as FinFET thinning, gap filler removal, pre-III-V deposition etch, and nanowire release etching. The key to developing solutions for these applications is being able to control the anisotropy of the Si etch, or the etch selectivity between Si (111), Si (100), and Si ...
Glenn Westwood, Chien-Pin Sherman Hsu
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NMR studies of molecular motion in tetramethylammonium hydroxide pentahydrate

Journal of Inclusion Phenomena and Molecular Recognition in Chemistry, 1990
Polycrystalline (CH3)4NOH·5 H2O (I) and (CH3)4NOD·5D2O (II) have been studied by1H NMR lineshapes, second moments and spin-lattice relaxation times and by2H NMR lineshapes as a function of temperature. From low temperatures the first motion to occur is reorientation of the internally rigid (CH3)4N+ ion about a uniqueC3′ axis (Eta = 8.37 kJ/mol forI,Ea =
C. I. Ratcliffe, S. K. Garg, D. W. Davidson   +2 more
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