Results 91 to 100 of about 4,153 (244)

Development of a highly conjugated chromophore for precise concentration determination of N(CH3)4OH and N(C4H9)4OH

Results in Chemistry
Tetramethylammonium hydroxide (TMAH) is a highly caustic organic base extensively utilized in semiconductor and display manufacturing processes, including photoresist development, silicon etching, and cleaning procedures.
Hyejin Kim, Haeri Lee
doaj   +1 more source

Spiking test-based evaluation of semiconductor wastewater reuse process under shock-loading conditions: Removal of TMAH and metal(loid) contaminants

Desalination and Water Treatment
Stable treatment performance is essential for semiconductor wastewater reuse systems under shock-loading conditions. This study evaluated the removal behavior of tetramethylammonium hydroxide (TMAH) and selected metal(loid)s in a lab-scale semiconductor ...
Deokhwan Kim, Jonghun Lee, Jeonghoo Sim, Yuying Liu, Byung-Moon Jun, June-Seok Choi, Hojung Rho   +6 more
doaj   +1 more source

Characterization of Silicon Anisotropic TMAH Etch for Bulk Micromachining

, 1998
In this paper the possibility to passivate the aluminum metalization in properly saturated TMAH solution is demostrated by doping the solution with appropiate amounts of silicic acid.
Guarnieri, Vittorio, Zen, Mario, Margesin, Benno, Giacomozzi, Flavio, Sebastiano Brida   +4 more
core  

Study of Under Etching Characters of Si (100) in Surfactant Added TMAH

, 2011
This work focuses on the etching characteristic of (100) silicon wafer in surfactant added tetramethyl-ammonium-hydroxide (TMAH:(CH3)(4)NOH) solution.
Hao, Yilong, Cheng Chen Gao, Hu, Qifang, Qi Fang Hu, Gao, Chengchen, Zhang, Yangxi, Yang Xi Zhang, Yi Long Hao   +7 more
core   +1 more source

바이폴라 이온교환막 전기투석을 통한 반도체 폐수 내 TMAH 분리 및 재이용 연구

, 2022
MasterTetramethyl ammonium hydroxide(TMAH)는 반도체 산업에서 사용되는 핵심 화합물 중 하나이다. 폐수에서 농도가 약1 wt%인 TMAH의 독성은 생물학적 처리 공정의 효율 저하를 초래할 수 있다. 또한 TMAH 폐수의 불순물은 매우 낮은 농도의 포토레지스트(PR) 화합물이 지배적이며 이는 유기물로 수산화라디칼과 반응성이 높은 것으로 알려져 있다.
주민욱
core  

Comparison of KOH and TMAH Etching on Sinw Arrays Fabricated via AFM Lithography

Journal of Physics: Conference Series, 2018
Silicon nanowire (SiNW) arrays were fabricated by using top-down fabrication approach via atomic force microcopy (AFM) lithography on silicon-on-insulator (SOI) (100) substrate.
N. N. Alias, K. A. Yaacob, Siti Noorhaniah Yusoh, A. Abdullah   +3 more
semanticscholar   +1 more source

Pengaruh Tegangan terhadap Karakter Nanopartikel Magnetit Terlapis Tetrametilamonium Hidroksida (TMAH) Hasil Sintesis secara Elektrokimia

, 2015
ABSTRAK   Sari, Tri Karunia Indah. 2015. Pengaruh Tegangan terhadap Karakter Nanopartikel Magnetit Terlapis Tetrametilamonium Hidroksida (TMAH) Hasil Sintesis Secara Elektrokimia.
Tri Karunia Indah Sari; Mahasiswa
core  

Electrochemical Impedance Spectroscopy (EIS) Analysis of BTA Removal by TMAH during Post Cu CMP Cleaning Process

, 2012
An ex situ electrochemical impedance spectroscopy (EIS) method is used to evaluate the effectiveness of tetramethyl ammonium hydroxide (TMAH) in removing benzotriazole (BTA) layer from Cu surface after chemical mechanical polishing (CMP).
���������
core   +1 more source

TMAH Based High Speed Silicon Bulk Micromachining for MEMS

, 2019
Various process steps such as oxidation, diffusion, etching, lithography, etc. are employed for the fabrication of microstructures used in microelectromechanical systems (MEMS).
Veerla, Swarnalatha, Pal, Prem
core  

COMPARISON OF IODINE DETERMINATION IN SPINACH USING 2% CH3COOH AND TMAH

Acta Scientiarum Polonorum: Hortorum Cultus, 2011
Tetramethylammonium hydroxide (TMAH) is the compound most commonly applied for iodine determination in environmental samples but, at the same time, is very harmful for human health when used as an analytical reagent.
Sylwester Smoleń, Piotr Strzetelski, Stanisław Rożek, Iwona Ledwożyw-Smoleń   +3 more
doaj