Results 81 to 90 of about 3,949 (198)
Characterization of Silicon Anisotropic TMAH Etch for Bulk Micromachining
, 1998 In this paper the possibility to passivate the aluminum metalization in properly saturated TMAH solution is demostrated by doping the solution with appropiate amounts of silicic acid.
Guarnieri, Vittorio +4 more
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, 2015 ABSTRAK Sari, Tri Karunia Indah. 2015. Pengaruh Tegangan terhadap Karakter Nanopartikel Magnetit Terlapis Tetrametilamonium Hidroksida (TMAH) Hasil Sintesis Secara Elektrokimia.
Tri Karunia Indah Sari; Mahasiswa
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COMPARISON OF IODINE DETERMINATION IN SPINACH USING 2% CH3COOH AND TMAH
Acta Scientiarum Polonorum: Hortorum Cultus, 2011 Tetramethylammonium hydroxide (TMAH) is the compound most commonly applied for iodine determination in environmental samples but, at the same time, is very harmful for human health when used as an analytical reagent.
Sylwester Smoleń +3 more
doaj
1/f Noise Characteristics of AlGaN/GaN FinFETs with and without TMAH surface treatment
, 2019 In this paper, we have fabricated and investigated the AlGaN/GaN fin-shaped field-effect transistors (FinFETs) with and without TMAH surface treatment.
Sakong, S +10 more
core +1 more source
Low leakage and high breakdown voltage GaN-on-GaN Schottky diode by TMAH surface treatment.
International audienceIn this study, the impact of surface treatment by TMAH and HF on the electrical characteristics of GaNon-GaN Schottky diode is explored by I-V and C-V characterisation.
Kaltsounis, Thomas +9 more
core +3 more sources
TMAH Based High Speed Silicon Bulk Micromachining for MEMS
, 2019 Various process steps such as oxidation, diffusion, etching, lithography, etc. are employed for the fabrication of microstructures used in microelectromechanical systems (MEMS).
Veerla, Swarnalatha, Pal, Prem
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바이폴라 이온교환막 전기투석을 통한 반도체 폐수 내 TMAH 분리 및 재이용 연구
, 2022 MasterTetramethyl ammonium hydroxide(TMAH)는 반도체 산업에서 사용되는 핵심 화합물 중 하나이다. 폐수에서 농도가 약1 wt%인 TMAH의 독성은 생물학적 처리 공정의 효율 저하를 초래할 수 있다. 또한 TMAH 폐수의 불순물은 매우 낮은 농도의 포토레지스트(PR) 화합물이 지배적이며 이는 유기물로 수산화라디칼과 반응성이 높은 것으로 알려져 있다.
주민욱
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Study of Under Etching Characters of Si (100) in Surfactant Added TMAH
, 2011 This work focuses on the etching characteristic of (100) silicon wafer in surfactant added tetramethyl-ammonium-hydroxide (TMAH:(CH3)(4)NOH) solution.
Hao, Yilong +7 more
core +1 more source
APL MaterialsThe development of low-resistance Gallium nitride (GaN) trench metal-oxide semiconductor (MOS) channels is required. Since the trenches are formed by dry etching, their surfaces are inevitably exposed to plasma, leading to plasma-induced damage ...
Hirohisa Hirai +3 more
doaj +1 more source
Dual-doped TMAH silicon etchant for microelectromechanical structures and systems applications
, 2000 Tetra-methyl ammonium-hydroxide (TMAH), is an anisotropic silicon etchant that is gaining considerable use in silicon micromachining due to its excellent silicon etch rate, etch selectivity to masking layers, degree of anisotropy, and relatively low ...
L. +5 more
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