Results 71 to 80 of about 3,949 (198)

GC-MS data with TMAH derivatization (raw files)

, 2022
Raw files of GCMS data with TMAH derivatization of secondary mineral deposits in Craters of the Moon National Monument and ...
Margaret Weng (13104891)
core   +1 more source

An Investigation into the Adsorption Characteristics of Grafted Mesoporous Silicates for the Removal of Tetramethyl Ammonium Hydroxide from Aqueous Solution

Adsorption Science & Technology, 2002
Four cubic mesoporous silicates (CMS), one unmodified and three grafted with amine, carboxylic and cyano surface functional groups, were prepared, characterised and compared as adsorbents for tetramethyl ammonium hydroxide (TMAH) from aqueous solution ...
Brian P. Kelleher, Aidan M. Doyle, Benjamin K. Hodnett, Thomas F. O'Dwyer   +3 more
doaj   +1 more source

Development of a highly conjugated chromophore for precise concentration determination of N(CH3)4OH and N(C4H9)4OH

Results in Chemistry
Tetramethylammonium hydroxide (TMAH) is a highly caustic organic base extensively utilized in semiconductor and display manufacturing processes, including photoresist development, silicon etching, and cleaning procedures.
Hyejin Kim, Haeri Lee
doaj   +1 more source

Tetramethylammonium hydroxide (TMAH) treatment of dry-etched trenches on (010) β-Ga2O3 to enhance trench profiles [PDF]

AIP Advances
We demonstrated heated tetramethylammonium hydroxide (TMAH) etching (25 wt. % concentration, at 90 °C) as an effective post-dry-etch treatment for improving dry-etched trench profiles on (010) β-Ga2O3. This treatment successfully converted rough, tapered
Takayoshi Oshima
doaj   +1 more source

A novel ZnO piezoelectric microcantilever energy scavenger: Fabrication and characterization

Sensing and Bio-Sensing Research, 2016
This novel piezoelectric zinc oxide (ZnO) thin film microcantilever was fabricated by micromachining technique. To release the cantilever, wet anisotropic etching of Silicon (Si) was performed by tetramethyl ammonium hydroxide (TMAH).
Deepak Bhatia, Himanshu Sharma, R.S. Meena, V.R. Palkar   +3 more
doaj   +1 more source

Evaluation of methanogenic treatment of TMAH (tetra-methyl ammonium hydroxide) in a full-scale TFT-LCD wastewater treatment process

, 2010
This study evaluated TMAH biodegradation under methanogenic conditions. Under methanogenic conditions, a sludge from a full-scale UASB treating TFT-LCD wastewater was able to degrade 2,000 mg/L of TMAH within 10 h and attained a specific degradation rate
C. F. Chen, T. Y. Chiang, H. W. Chen, T. H. Hu, S. S. Cheng, L. M. Whang, C. N. Lei, L. B. Lin, P. W. G. Liu   +8 more
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Plasma‐Enabled Simultaneous Synthesis and Nano‐Anchoring of TiO2−x Nanolayers on Mesoporous Bio‐Silica for Effective Photodegradation of Tetramethylammonium Hydroxide

SusMat
Organic pollutants from semiconductor manufacturing pose significant threats to aquatic ecosystems and remain challenging to treat. To address these issues, mesoporous bio‐silica (diatomite) was employed as a platform material to accommodate titanium ...
Ali M. Abou‐Elanwar, Sunwoo Kim, So Young Lee, Jeongkyun Yu, Donguk Choi, Min Seob Kim, Chihyun Hwang, Hyungmin Park, Youngtai Noh, Nam Dong Kim, Ming Xie, Jiuyang Lin, Seongju Park, Youngjin Kim, Dong Han Seo   +14 more
doaj   +1 more source

Studies on characteristic of TMAH etch

, 2003
【中文文摘】TMAH是一种具有优良的腐蚀性能的各向异性腐蚀剂,选择性好,无毒且不污染环境,最重要的是TMAH与CMOS工艺相兼容,符合SOC的发展趋势。TMAH正逐渐替代KOH和其他腐蚀液,成为实现MEMS工艺中微三维结构的主要腐蚀剂。本文着重介绍了TMAH的特性、工艺条件及应用。 【英文文摘】Polyimide can resist high temperature and etching,and has excellent properties of in-sulation and chemical
邓俊泳, 冯勇建
core  

Removal of tetramethylammonium hydroxide (TMAH) in semiconductor wastewater using the nano-ozone H2O2 process

, 2021
In this study, we used a nano-ozone bubble to enhance the efficiency of the ozone/H(2)O(2 )process for the degradation of tetramethylammonium hydroxide (TMAH) found in semiconductor wastewater at high levels. The nano-ozone bubble significantly increased
Lee, Inae, Kim, Tae-Kyoung, Zoh, Kyung-Duk, Choi, Kyungho, Kim, Taeyeon   +4 more
core   +1 more source

Spiking test-based evaluation of semiconductor wastewater reuse process under shock-loading conditions: Removal of TMAH and metal(loid) contaminants

Desalination and Water Treatment
Stable treatment performance is essential for semiconductor wastewater reuse systems under shock-loading conditions. This study evaluated the removal behavior of tetramethylammonium hydroxide (TMAH) and selected metal(loid)s in a lab-scale semiconductor ...
Deokhwan Kim, Jonghun Lee, Jeonghoo Sim, Yuying Liu, Byung-Moon Jun, June-Seok Choi, Hojung Rho   +6 more
doaj   +1 more source