Results 11 to 20 of about 261,592 (260)
Sodium diffusion in 4H-SiC [PDF]
Sodium diffusion has been studied in p-type 4H-SiC. Heat treatments have been performed from 1200 °C to 1800 °C for 1 min to 4 h. Secondary ion mass spectrometry has been used to measure the sodium distribution.
M. K. Linnarsson, A. Hallén
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Microelectromechanical system (MEMS) pressure sensors based on silicon are widely used and offer the benefits of miniaturization and high precision. However, they cannot easily withstand high temperatures exceeding 150 °C because of intrinsic material ...
Chen Wu +10 more
semanticscholar +1 more source
An ultra-stable all-weather service piezoelectric nanogenerator (PENG) with a wide operating temperature range (-80~80 ℃) and a wide operating relative humidity range (0~100%) is proposed.
Linlin Zhou +8 more
semanticscholar +1 more source
Dislocation-related leakage-current paths of 4H silicon carbide
Improving the quality of 4H silicon carbide (4H-SiC) epitaxial layers to reduce the leakage current of 4H-SiC based high-power devices is a long-standing issue in the development of 4H-SiC homoepitaxy.
Wandong Gao +13 more
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Investigation of the Anisotropy of 4H-SiC Materials in Nanoindentation and Scratch Experiments
Silicon carbide is an ideal material for advanced electronics, military, and aerospace applications due to its superior physical and chemical properties.
Suhua Shi +6 more
semanticscholar +1 more source
4H-SiC Schottky Barrier Diodes as Radiation Detectors: A Review
In this review paper, an overview of the application of n-type 4H-SiC Schottky barrier diodes (SBDs) as radiation detectors is given. We have chosen 4H-SiC SBDs among other semiconductor devices such as PiN diodes or metal-oxide-semiconductor (MOS ...
I. Capan
semanticscholar +1 more source
In recent years, 4H-SiC power devices have been widely employed in power electronic systems owing to their superior performance to Si power devices. However, stacking faults in 4H-SiC can degrade the device performance.
Kazuhiro Tanaka, Masashi Kato
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Chemical–Mechanical Polishing of 4H Silicon Carbide Wafers
4H silicon carbide (4H‐SiC) holds great promise for high‐power and high‐frequency electronics, in which high‐quality 4H‐SiC wafers with both global and local planarization are cornerstones.
Wantang Wang +6 more
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Modified divacancies in 4H-SiC
Divacancies near or at lattice defects in SiC, the PL5–PL7 photoluminescence centers, are known to have more favorable optical and spin properties for applications in quantum technology compared to the usual divacancies. These centers were previously predicted to be divacancies near stacking faults. Using electron paramagnetic resonance, we observe PL5,
N. T. Son +3 more
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Suppression of stacking fault expansion in a 4H-SiC epitaxial layer by proton irradiation
SiC bipolar degradation, which is caused by stacking fault expansion from basal plane dislocations in a SiC epitaxial layer or near the interface between the epitaxial layer and the substrate, is one of the critical problems inhibiting widespread usage ...
S. Harada +3 more
semanticscholar +1 more source

