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Organoselenium Precursors for Atomic Layer Deposition [PDF]

ACS Omega, 2021
Organoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H2Se and diethyl(di)selenide has recently been extended by bis(trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N ...
Jaroslav Charvot, Raul Zazpe, Jan M. Macak, Filip Bureš   +3 more
doaj   +5 more sources

ZnO layers deposited by Atomic Layer Deposition [PDF]

Journal of Physics: Conference Series, 2013
The structure of 40 nm thick epitaxial ZnO layers grown on single crystalline sapphire and GaN substrates by atomic layer deposition has been studied using transmission electron microscopy. The growth is carried out between 150?C and 300?C without any buffer layer using di-ethyl zinc and water precursors.
Pécz, Béla, Baji, Zsófia, Lábadi, Zoltán, Kovács, András   +3 more
openaire   +3 more sources

Atomic layer deposition of ZnS nanotubes [PDF]

Nanotechnology, 2009
We report on growth of high-aspect-ratio ($\gtrsim300$) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as low as 75 $^{\circ}$C.
Farhangfar, Sh., Yang, R. B., Pelletier, M., Nielsch, K.   +3 more
openaire   +4 more sources

Fabrication of β-Ga₂O₃ Nanotubes via Sacrificial GaSb-Nanowire Templates

Nanomaterials, 2023
β-Ga2O3 nanostructures are attractive wide-band-gap semiconductor materials as they exhibit promising photoelectric properties and potential applications.
Lei Shangguan, Long-Bing He, Sheng-Pan Dong, Yu-Tian Gao, Qian Sun, Jiong-Hao Zhu, Hua Hong, Chao Zhu, Zai-Xing Yang, Li-Tao Sun   +9 more
doaj   +1 more source

Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride [PDF]

ACS Omega
Bernhard Y. van der Wel, Kees van der Zouw, Antonius A.I. Aarnink, Alexey Y. Kovalgin   +3 more
doaj   +2 more sources

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

Nanomaterials, 2022
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj   +1 more source

Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

Nanomaterials, 2022
The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim, Benedito Botan Neto, Michaela Shiotani, Júlia Karnopp, Luan Gonçalves, João Pedro Chaves, Argemiro da Silva Sobrinho, Joaquim Pratas Leitão, Mariana Fraga, Rodrigo Pessoa   +9 more
doaj   +1 more source

Atomic Layer Deposition of Nanolayered Carbon Films

C, 2021
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film.
Zhigang Xiao, Kim Kisslinger, Rebhadevi Monikandan   +2 more
doaj   +1 more source

Atomic Layer Deposited Protective Layers [PDF]

Materials Science Forum, 2016
This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings.
Salmi E., Leskelä M., Ritala M.
openaire   +2 more sources

Atomic Layer Deposition of Antibacterial Nanocoatings: A Review

Antibiotics, 2023
In recent years, antibacterial coatings have become an important approach in the global fight against bacterial pathogens. Developments in materials science, chemistry, and biochemistry have led to a plethora of materials and chemical compounds that have
Denis Nazarov, Lada Kozlova, Elizaveta Rogacheva, Ludmila Kraeva, Maxim Maximov   +4 more
doaj   +1 more source