Results 1 to 10 of about 280,313 (347)
Organoselenium Precursors for Atomic Layer Deposition [PDF]
Organoselenium compounds with perspective application as Se precursors for atomic layer deposition have been reviewed. The originally limited portfolio of available Se precursors such as H2Se and diethyl(di)selenide has recently been extended by bis(trialkylsilyl)selenides, bis(trialkylstannyl)selenides, cyclic selenides, and tetrakis(N,N ...
Jaroslav Charvot+3 more
doaj +6 more sources
ZnO layers deposited by Atomic Layer Deposition [PDF]
The structure of 40 nm thick epitaxial ZnO layers grown on single crystalline sapphire and GaN substrates by atomic layer deposition has been studied using transmission electron microscopy.
A Kovács+4 more
core +4 more sources
Atomic layer deposition of ZnS nanotubes [PDF]
We report on growth of high-aspect-ratio ($\gtrsim300$) zinc sulfide nanotubes with variable, precisely tunable, wall thicknesses and tube diameters into highly ordered pores of anodic alumina templates by atomic layer deposition (ALD) at temperatures as
K Nielsch+9 more
core +4 more sources
Photonic crystal thin films of GaAs prepared by atomic layer deposition [PDF]
Photonic crystal thin films were fabricated via the self-assembly of a lattice of silica spheres on silicon (100) substrates. Progressive infilling of the air spaces within the structure with GaAs was achieved using trimethylgallium and arsine under ...
Ian M. Povey+5 more
openalex +5 more sources
Fabrication of β-Ga2O3 Nanotubes via Sacrificial GaSb-Nanowire Templates
β-Ga2O3 nanostructures are attractive wide-band-gap semiconductor materials as they exhibit promising photoelectric properties and potential applications.
Lei Shangguan+9 more
doaj +1 more source
Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj +1 more source
Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching
The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim+9 more
doaj +1 more source
Atomic Layer Deposition of Nanolayered Carbon Films
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film.
Zhigang Xiao+2 more
doaj +1 more source
Atomic Layer Deposited Protective Layers [PDF]
This paper reviews the use of Atomic Layer Deposition (ALD) in protective coatings. Because of the growth principle ALD allows the deposition of dense conformal films on substrates of different size and shape. Recently, ALD has received increasingly interest in deposition of protective coatings.
Leskelä, M., Salmi, E., Ritala, M.
openaire +3 more sources
The use of computational modelling and simulation methodologies has grown in recent years as researchers try to understand the atomic layer deposition (ALD) process and create new microstructures and nanostructures.
Sibanda David+2 more
doaj +1 more source