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A review of atomic layer deposition modelling and simulation methodologies: Density functional theory and molecular dynamics

open access: yesNanotechnology Reviews, 2022
The use of computational modelling and simulation methodologies has grown in recent years as researchers try to understand the atomic layer deposition (ALD) process and create new microstructures and nanostructures.
Sibanda David   +2 more
doaj   +2 more sources

Fabrication of β-Ga2O3 Nanotubes via Sacrificial GaSb-Nanowire Templates

open access: yesNanomaterials, 2023
β-Ga2O3 nanostructures are attractive wide-band-gap semiconductor materials as they exhibit promising photoelectric properties and potential applications.
Lei Shangguan   +9 more
doaj   +1 more source

Area-Selective Low-Pressure Thermal Atomic Layer Deposition of Gallium Nitride [PDF]

open access: yesACS Omega
Bernhard Y. van der Wel   +3 more
doaj   +2 more sources

Emerging Atomic Layer Deposition for the Development of High-Performance Lithium-Ion Batteries

open access: yesElectrochemical Energy Reviews, 2023
With the increasing demand for low-cost and environmentally friendly energy, the application of rechargeable lithium-ion batteries (LIBs) as reliable energy storage devices in electric cars, portable electronic devices and space satellites is on the rise.
Sina Karimzadeh   +3 more
semanticscholar   +1 more source

Recent Progress of Atomic Layer Technology in Spintronics: Mechanism, Materials and Prospects

open access: yesNanomaterials, 2022
The atomic layer technique is generating a lot of excitement and study due to its profound physics and enormous potential in device fabrication. This article reviews current developments in atomic layer technology for spintronics, including atomic layer ...
Yuanlu Tsai, Zhiteng Li, Shaojie Hu
doaj   +1 more source

Atomic layer deposition to heterostructures for application in gas sensors

open access: yesInternational Journal of Extreme Manufacturing, 2023
Atomic layer deposition (ALD) is a versatile technique to deposit metals and metal oxide sensing materials at the atomic scale to achieve improved sensor functions.
Hongyin Pan   +5 more
semanticscholar   +1 more source

Plasma-Assisted Nanofabrication: The Potential and Challenges in Atomic Layer Deposition and Etching

open access: yesNanomaterials, 2022
The growing need for increasingly miniaturized devices has placed high importance and demands on nanofabrication technologies with high-quality, low temperatures, and low-cost techniques.
William Chiappim   +9 more
doaj   +1 more source

Atomic Layer Deposition of Nanolayered Carbon Films

open access: yesC, 2021
In this paper, carbon thin films were grown using the plasma-enhanced atomic layer deposition (PE-ALD). Methane (CH4) was used as the carbon precursor to grow the carbon thin film.
Zhigang Xiao   +2 more
doaj   +1 more source

Advances in Atomic Layer Deposition

open access: yesNanomanufacturing and Metrology, 2022
Atomic layer deposition (ALD) is a thin-film fabrication technique that has great potential in nanofabrication. Based on its self-limiting surface reactions, ALD has excellent conformality, sub-nanometer thickness control, and good process compatibility.
Jingming Zhang   +3 more
semanticscholar   +1 more source

Atomic-Scale Layer-by-Layer Deposition of FeSiAl@ZnO@Al2O3 Hybrid with Threshold Anti-Corrosion and Ultra-High Microwave Absorption Properties in Low-Frequency Bands

open access: yesNano-Micro Letters, 2021
A multiscale structure is realized through layer-by-layer deposition with atom-scale precision via atomic layer deposition FeSiAl@ZnO@Al 2 O 3 exhibits record-high absorption properties in low-frequency bands.
Wei Tian   +7 more
semanticscholar   +1 more source

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