Atomic/molecular layer deposition for energy storage and conversion.
Chemical Society Reviews, 2021 Energy storage and conversion systems, including batteries, supercapacitors, fuel cells, solar cells, and photoelectrochemical water splitting, have played vital roles in the reduction of fossil fuel usage, addressing environmental issues and the ...
Yang Zhao +10 more
semanticscholar +1 more source
Atomic Layer Deposition of Antibacterial Nanocoatings: A Review
Antibiotics, 2023 In recent years, antibacterial coatings have become an important approach in the global fight against bacterial pathogens. Developments in materials science, chemistry, and biochemistry have led to a plethora of materials and chemical compounds that have
Denis Nazarov +4 more
doaj +1 more source
Frequency dispersion reduction and bond conversion on n-type GaAs by in situ surface oxide removal and passivation [PDF]
, 2007 The method of surface preparation on n-type GaAs, even with the presence of an amorphous-Si interfacial passivation layer, is shown to be a critical step in the removal of accumulation capacitance frequency dispersion.
A. M. Sonnet +11 more
core +1 more source
Crystalline AlN Interfacial Layer on GaN Using Plasma-Enhanced Atomic Layer Deposition
Crystals, 2021 In this study, we report on the deposition of a highly crystalline AlN interfacial layer on GaN at 330 °C via plasma-enhanced atomic layer deposition (PEALD). Trimethylaluminum (TMA) and NH3 plasma were used as the Al and N precursors, respectively.
Il-Hwan Hwang +3 more
doaj +1 more source
Development and Prospect of Process Models and Simulation Methods for Atomic Layer Deposition
Journal of Microelectronic Manufacturing, 2019 Thin film deposition is one of the most important processes in IC manufacturing. In this paper, several typical models and numerical simulation methods for thin film deposition and atomic layer deposition are introduced. Several modeling methods based on
Lei Qu +7 more
doaj +1 more source
Understanding chemical and physical mechanisms in atomic layer deposition.
Journal of Chemical Physics, 2020 Atomic layer deposition (ALD) is a powerful tool for achieving atomic level control in the deposition of thin films. However, several physical and chemical phenomena can occur which cause deviation from "ideal" film growth during ALD.
Nathaniel E. Richey +2 more
semanticscholar +1 more source
Coating strategies for atomic layer deposition
Nanotechnology Reviews, 2017 Atomic layer deposition (ALD) is a vapor phase technique capable of producing a variety of materials. It consists of the alternation of separate self-limiting surface reactions, which enables accurate control of film thickness at the Angstrom level.
Hu Liang, Qi Weihong, Li Yejun
doaj +1 more source
Positive exchange bias in ferromagnetic La0.67Sr0.33MnO3 / SrRuO3 bilayers [PDF]
, 2004 Epitaxial La0.67Sr0.33MnO3 (LSMO)/ SrRuO3 (SRO) ferromagnetic bilayers have been grown on (001) SrTiO3 (STO) substrates by pulsed laser deposition with atomic layer control. We observe a shift in the magnetic hysteresis loop of the LSMO layer in the same
C. B. Eom +4 more
core +1 more source
GaAs interfacial self-cleaning by atomic layer deposition [PDF]
, 2008 The reduction and removal of surface oxides from GaAs substrates by atomic layer deposition (ALD) of Al2O3 and HfO2 are studied using in situ monochromatic x-ray photoelectron spectroscopy.
A. M. Sonnet +12 more
core +1 more source
Magnesium Sublimation for Growing Thin Films and Conformal Coatings on 1D Nanostructures
Nanomanufacturing, 2022 A method to conformally coat silica nanosprings with magnesium via sublimation at 450 °C has been developed. In addition, Mg thin films were grown on Si(100) using this method to determine the effects of substrate morphology (nanoscale curvatures vs ...
Aaron J. Austin +7 more
doaj +1 more source